Photonics Source provides 136 categories and 7939 products.
-
Elite Photonics Product
Insertion Loss (dB) 1x2: ≤4.0 Insertion Loss (dB) 1x4: ≤7.4 Uniformity (dB) 1x2: ≤0.6 Uniformity (dB) 1x4: ≤1.0 Return Loss (dB): ≥50 -
Surface Roughness Tester
Maximum Value: 6.7μm Minimum Value: 5.5μm Average Value: 6.0μm Standard Deviation: 0.3 Measured Value: 8.1μm -
XDR-100
Light Source Type: Laser Wavelength Range: 400-700nm Resolution: 0.1nm Measurement Range: 0-100mm Power Supply Voltage: 220V -
XAU X-Ray Fluorescence Analyzer
Elemental Analysis Range: Na to U Detection Method: X-ray fluorescence Sample Type: Solid Sample Type: liquid Sample Type: powder -
XTU-4C
Light Source Type: X-ray Power Supply Voltage: 220V Operating Temperature: 0-40°C Display Screen: Touchscreen Radiation Safety Level: Compliant with international standards -
Elite Photonics Product
Insertion Loss (dB) 1x2: ≤4.0 Insertion Loss (dB) 1x4: ≤7.4 Uniformity (dB) 1x2: ≤0.6 Uniformity (dB) 1x4: ≤1.0 Return Loss (dB): ≥50 -
NLD-5700
Chamber Size: Standard Plasma Source: Inductively Coupled Plasma (ICP) Gas Flow Control Range: Wide range Vacuum Level: High vacuum Processing Capability: High throughput -
SOPHI
Inspection Speed: High Resolution: High Dimensions: Compact Power Supply: Standard AC Interface: User-friendly touchscreen -
Unknown
Material: Copper and aluminum Diameter: Varies by model Surface Roughness: ≤0.5nm Flatness: ≤λ/10 -
SOPHI
Dimensions: Customizable Power Requirements: AC200V, 50/60Hz Operating Temperature: 15-30°C Humidity Range: 20-80% (non-condensing) Control System: Touchscreen Interface -
e5
Chamber Size: 500mm x 500mm Vacuum Level: ≤10^-6 Pa Power Supply: AC200V, 50/60Hz Control System: Touchscreen interface Deposition Rate: Up to 10nm/min -
EC-200
Operating Temperature Range: 10°C-40°C Vacuum Level: ≤10⁻⁶ Torr Film Thickness Uniformity: ≤±2% Substrate Size: 200mm Power Consumption: ≤10kW -
SOPHI
Dimensions: Customizable Power Requirements: AC200V, 3-phase, 50/60Hz Polishing Accuracy: Sub-nanometer level Processing Capacity: High throughput Control System: Automated with touch screen interface -
SOPHI
Processing Capacity: High throughput Control System: Automated with touch screen interface Dimensions: Compact design for cleanroom integration Power Requirements: Standard industrial power supply Compatibility: Supports various wafer sizes and materials -
High-Precision Coating System
Coating Uniformity: ≤0.5% Maximum Substrate Size: 300mm Cycle Time: ≤60s Power Consumption: ≤10kW Vacuum Level: ≤10^-6 Torr -
CERC-300
Processing Capacity: 300mm wafers Vacuum Level: High vacuum Control Accuracy: ±0.1% Dimensions: 2000mm x 1500mm x 2500mm Weight: 1500kg -
NLD-570
Dimensions: 1200mm x 1500mm x 1800mm Weight: 1500kg Power Requirements: AC200V, 50/60Hz, 3-phase Gas Flow Control Range: 0-500sccm Vacuum Level: 1x10^-6Pa -
Unknown
Dimensions: Unknown Weight: Unknown Power Consumption: Unknown Operating Temperature: Unknown Input Voltage: Unknown -
Dry Etching System NE-7800
Number of Chambers: 2 Processing Capability: High throughput Etching Precision: High Supported Materials: Various semiconductor materials Control System: Advanced automated control -
NE-7800 Dry Etching System
Number of Chambers: 2 Processing Capability: High-volume production Etching Precision: Sub-micron level Supported Materials: Various semiconductor materials Control System: Advanced automated control