NLD-5700
The NLD-5700 is a high-performance plasma etching system designed for advanced semiconductor manufacturing processes. It offers precise etching capabilities for various materials, ensuring high accuracy and efficiency.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Chamber Size | Standard |
| Plasma Source | Inductively Coupled Plasma (ICP) |
| Gas Flow Control Range | Wide range |
| Vacuum Level | High vacuum |
| Processing Capability | High throughput |
| Control System | Advanced automation system |
| Cooling System | Integrated cooling system |
| Power Requirements | Standard industrial power supply |
| Dimensions | Compact design |
| Weight | Heavy-duty construction |
| Material Compatibility | Wide range of materials |
| Operation Interface | User-friendly interface |
Applications
Key Features
Datasheet
Supplier Information
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