NLD-570
The NLD-570 is a high-performance plasma etching system designed for precise and efficient etching processes in semiconductor manufacturing.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Dimensions | 1200mm x 1500mm x 1800mm |
| Weight | 1500kg |
| Power Requirements | AC200V, 50/60Hz, 3-phase |
| Gas Flow Control Range | 0-500sccm |
| Vacuum Level | 1x10^-6Pa |
| Plasma Frequency | 13.56MHz |
| Temperature Control Range | Room temperature to 200°C |
| Etching Rate | 0.1-1.0μm/min |
| Process Gases | CF4, O2, Ar, SF6 |
| Chamber Material | Aluminum |
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