NE-7800 Dry Etching System
The NE-7800 Dry Etching System is a high-performance etching solution designed for advanced semiconductor manufacturing processes. It offers precise etching capabilities for various materials, ensuring high accuracy and efficiency.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Number of Chambers | 2 |
| Processing Capability | High-volume production |
| Etching Precision | Sub-micron level |
| Supported Materials | Various semiconductor materials |
| Control System | Advanced automated control |
| Vacuum Level | High vacuum |
| Gas Flow Control | Precise control |
| Footprint | Compact design |
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Key Features
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Supplier Information
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