Dry Etching System NE-7800
The NE-7800 is a high-performance dry etching system designed for advanced semiconductor manufacturing processes. It offers precise etching capabilities for various materials, ensuring high accuracy and efficiency.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Number of Chambers | 2 |
| Processing Capability | High throughput |
| Etching Precision | High |
| Supported Materials | Various semiconductor materials |
| Control System | Advanced automated control |
| Vacuum System | High vacuum capability |
| Footprint | Compact design |
| Power Requirements | Standard industrial power supply |
| Cooling System | Integrated cooling system |
| Gas Flow Control | High precision |
| User Interface | Touchscreen interface |
Applications
Key Features
Datasheet
Supplier Information
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