Micro- and nano-engraving
The system comprises nanosecond and picosecond lasers, a laser-engraving controller, laser coupling and focusing optics, beam-motion control and a three-dimensional sample-positioning module. Multiple coupled pulsed lasers precisely process two-dimensional materials and artificial metasurfaces made of different materials. It is particularly suitable for heterostructures, multilayer structures and more complex systems, providing a tool for constructing two-dimensional artificial metasurfaces and functional micro/nano optical structures. K-Star UV Laser Engraving 2.0.
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Overview
Specifications
| Parameter | Value |
|---|---|
| ns Laser - Power | ≥5W |
| ns Laser - Pulse width | <15ns |
| ns Laser - Pulse Energy | >150μJ |
| ns Laser - Beam quality M² | M²<1.2 |
| ns Laser - Divergence angle | <1.5mrad |
| Nanosecond laser - Pointing stability | <20μrad/°C |
| Nanosecond laser - Power stability [RMS] | <1%RMS |
| ps Laser - Power | ≥20W |
| ps Laser - Pulse width | <10ps |
| ps Laser - Pulse Energy | >20μJ |
| ps Laser - Beam quality M² | M²<1.2 |
| ps Laser - Divergence angle | <1mrad |
| Picosecond laser - Pointing stability | <40μrad/°C |
| Picosecond laser - Power stability [RMS] | <1%RMS |
| Beam expansion System | 6x/8x |
| Galvanometer scanner - Clear Aperture Dimension | 14 Clear Aperture Dimension |
| Processing scan range | ≥25cm² |
| Processing scan speed | >500mm/s |
| X-direction fine adjustment range | 50mm |
| Y-direction fine adjustment range | 80mm |
| Z-direction fine adjustment range | 80mm |
| Power supply requirements | AC 220V±5% 25A |
| Software support | Import of dxf, txt, plt, ai, gbr and other common vector-graphics files |
Applications
Key Features
Datasheet
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Supplier Information
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