This is a floor-standing, cleanroom-compatible single-wafer spin processing system designed for programmable spin cleaning, rinsing and nitrogen drying of semiconductor and optoelectronic wafers. The machine integrates an enclosed process chamber with a transparent safety cover and interlock, a high-precision spin chuck, PLC control with a color HMI touchscreen, multiple panel-mounted float flowmeters for DI water/process gas monitoring, an emergency stop (EMO) button and a three-color tower light for real-time status indication. The lower cabinet houses the electrical and fluid control units, and the whole system is mounted on heavy-duty casters with leveling feet for easy relocation and installation in fabs, pilot lines and laboratories.
| Parameter | Value |
| Compatible Wafer Size | 2-8inch |
| Spindle Speed Range | 100-6000rpm |
| Speed Accuracy | ±1rpm |
| Acceleration | 100-10000rpm/s |
| Process Recipe Capacity | ≥50 |
| Control Mode | PLC+HMI touch screen |
| Display | Color HMI touch screen |
| Process Liquid | DI water/chemical solution |
| Process Gas | N2/CDA |
| Flowmeter Channels | 4 |
| Drying Method | N2 spin drying |
| Safety Protection | Chamber door interlock |
| Safety Protection | EMO button |
| Status Indication | 3-color tower light with buzzer |
| Power Supply | AC220V,50/60Hz |
| Power Consumption | ≤3kW |
| Dimensions (W×D×H) | ≈800×900×1600mm |
| Equipment Weight | ≈400kg |
| Mobility | Heavy-duty casters with leveling feet |
1. Silicon, compound semiconductor (GaAs, InP, SiC, GaN) wafer cleaning and drying processes 2. LED chip and epitaxial wafer surface cleaning in optoelectronics manufacturing 3. Laser diode, photodetector and photonic integrated device fabrication 4. MEMS and sensor device wet process and spin drying 5. Optical substrate and optical component precision cleaning 6. R&D laboratories, universities and semiconductor pilot production lines
1. Fully enclosed process chamber with transparent safety cover and door interlock to protect operators from splash and mist 2. PLC control system with color HMI touch screen, supporting multi-step programmable cleaning, rinsing and drying recipes 3. High-precision spin chuck with stable speed control for uniform cleaning and fast N2 drying 4. Multiple panel-mounted float flowmeters for real-time monitoring of DI water, chemical and gas flows 5. Three-color tower light and buzzer for clear equipment status indication 6. Emergency stop (EMO) button for immediate shutdown in abnormal conditions 7. Compact floor-standing design with separated upper process area and lower electrical/fluid cabinet 8. Heavy-duty casters with leveling feet for easy movement and stable installation in cleanrooms
<p>Since its establishment in 2014, Qisheng Precision has been focusing on the semiconductor and precision manufacturing industry, specializing in R&D and manufacturing of dicing equipment, superhard tools, and precision grinding products. It is one of the few high-tech enterprises in China that truly achieves dual-track independent R&D of "equipment + tools". Core strengths: integrated R&D and manufacturing, three business divisions, full-chain capability; professional R&D team mastering core technologies. Core products: precision dicing machines, full series of dicing blades (electroformed, resin, metal), precision grinding products (thinning wheels, ceramic chucks, etc.). Applications: integrated circuits, LED chips, optical components, new energy batteries, electronic ceramics, magnetic materials. Served thousands of enterprises across 30 provinces. Vision: Perseverance, proactiveness, harmonious work, self-transcendence; striving for innovation and precision.</p>