P-Type Silicon Carbide Epitaxy
P-Type SiC Epitaxy with Acceptor Dopants such as Al/B on SiC,Wide Bandgap,High Thermal Conductivity/Breakdown Field.
Specification Snapshot
P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter
2 inch - 50.8mm
P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter
4 inch - 100mm
P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter
6 inch - 150mm
P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter
8 inch - 200mm
P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 2 inch - 50.8mm]
350μm
P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 4 inch - 100mm]
350μm
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Overview
P-Type SiC Epitaxy with Acceptor Dopants such as Al/B on SiC,Wide Bandgap,High Thermal Conductivity/Breakdown Field.
Specifications
| Parameter | Value |
|---|---|
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter | 2 inch - 50.8mm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter | 4 inch - 100mm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter | 6 inch - 150mm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Substrate Diameter | 8 inch - 200mm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 2 inch - 50.8mm] | 350μm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 4 inch - 100mm] | 350μm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 6 inch - 150mm] | 350μm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 8 inch - 200mm] | 500μm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Crystal Orientation | Off-Axis:4°toward <11-20>±0.5° |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Silicon Carbide Substrate Resistivity | 0.014~0.028 Ω•cm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Epitaxial Conductivity Type | P-type |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Dopant Element | Al-doping |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Epitaxial Layer Thickness | <5μm |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Epitaxial Layer Thickness Uniformity | ≤6% |
| P-Type Silicon Carbide Epitaxial Substrate (2~8 Inches) - Epitaxial Layer Surface | RMS<1nm |
Applications
Power Electronics(Efficient Converters,EVs,Industrial Motor Drives),High-Temperature Devices,IGBTs(EVs,Power Systems),BJTs(High-Power Amplification/Switching),RF Devices(5G Base Stations,Radar);Especially Suited to High-Power,High-Frequency,High-Temperature Environments
Datasheet
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Supplier Information
Jiangyin Jingmu Optoelectronic New Materials Co., Ltd. is a technology-oriented enterprise dedicated to semiconductor wafer material processing and epitaxial technology. With a decade of focus on semiconductor substrates, including SiC, sapphire, silicon, and third/fourth-generation materials like diamond, GaN, Ga2O3, AlN, it also provides optical wafers and carrier products. Equipped with advanced processing technologies such as cutting, grinding, polishing, laser processing, epitaxial coating, and wafer bonding, it collaborates with universities for R&D, offering customized solutions. Products are widely used in LED, power devices, RF, and optical communication.
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