High-Borosilicate Glass BF33
BF33 Special Borosilicate Glass with Low Expansion,Heat Resistance,Chemical Stability and Excellent Transmission.
Specification Snapshot
High-Borosilicate Glass - Material
BF33
High-Borosilicate Glass - Diameter
50.8mm
High-Borosilicate Glass - Diameter
100mm
High-Borosilicate Glass - Diameter
150mm
High-Borosilicate Glass - Diameter
200mm
High-Borosilicate Glass - Thickness [Diameter: 50.8mm]
500μm
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Overview
BF33 Special Borosilicate Glass with Low Expansion,Heat Resistance,Chemical Stability and Excellent Transmission.
Specifications
| Parameter | Value |
|---|---|
| High-Borosilicate Glass - Material | BF33 |
| High-Borosilicate Glass - Diameter | 50.8mm |
| High-Borosilicate Glass - Diameter | 100mm |
| High-Borosilicate Glass - Diameter | 150mm |
| High-Borosilicate Glass - Diameter | 200mm |
| High-Borosilicate Glass - Thickness [Diameter: 50.8mm] | 500μm |
| High-Borosilicate Glass - Thickness [Diameter: 100mm] | 500μm |
| High-Borosilicate Glass - Thickness [Diameter: 150mm] | 1000μm |
| High-Borosilicate Glass - Thickness [Diameter: 200mm] | 1000μm |
| High-Borosilicate Glass - Orientation Flat [Diameter: 50.8mm] | 16mm |
| High-Borosilicate Glass - Orientation Flat [Diameter: 100mm] | 32.5mm |
| High-Borosilicate Glass - Orientation Flat [Diameter: 150mm] | 47.5mm |
| High-Borosilicate Glass - Orientation Flat [Diameter: 200mm] | Notch |
| Borosilicate Glass - Surface Finish | S/D 20/10 60/40 80/50 |
| Material Type [Product Introduction Material Comparison; Quartz JGS1] | High-Purity Synthetic Quartz |
| Main Constituents [Product Introduction Material Comparison; Quartz JGS1] | SiO₂(>99.99%) |
| Hydroxyl Content [Product Introduction Material Comparison; Quartz JGS1] | High (Approximately 1000 ppm) |
| Thermal Expansion Coefficient [Product Introduction Material Comparison; Quartz JGS1] | 0.55 × 10⁻⁶ /K (Extremely Low Expansion) |
| Heat Resistance [Product Introduction Material Comparison; Quartz JGS1] | Extremely High (Softening Point Approximately 1700°C) |
| Transmission Range [Product Introduction Material Comparison; Quartz JGS1] | 185 nm - 2500 nm |
| UV Transmittance [Product Introduction Material Comparison; Quartz JGS1] | Excellent (High Transmission from 185 nm) |
| Infrared Transmittance [Product Introduction Material Comparison; Quartz JGS1] | Poor (Affected by Hydroxyl Absorption at 2.7 μm) |
| Chemical Stability [Product Introduction Material Comparison; Quartz JGS1] | Excellent (Strong Acid/Alkali Resistance) |
| Mechanical Strength [Product Introduction Material Comparison; Quartz JGS1] | High |
| Main Applications [Product Introduction Material Comparison; Quartz JGS1] | UV Optics, Lasers, Semiconductors |
| Material Type [Product Introduction Material Comparison; Quartz JGS2] | Medium-Purity Quartz (Natural or Synthetic) |
| Main Constituents [Product Introduction Material Comparison; Quartz JGS2] | SiO₂(>99.9%) |
| Hydroxyl Content [Product Introduction Material Comparison; Quartz JGS2] | Low (Approximately 200 ppm) |
| Thermal Expansion Coefficient [Product Introduction Material Comparison; Quartz JGS2] | 0.55 × 10⁻⁶ /K (Extremely Low Expansion) |
| Heat Resistance [Product Introduction Material Comparison; Quartz JGS2] | Extremely High (Softening Point Approximately 1700°C) |
| Transmission Range [Product Introduction Material Comparison; Quartz JGS2] | 220 nm - 2500 nm |
| UV Transmittance [Product Introduction Material Comparison; Quartz JGS2] | Relatively Poor (Low Transmission below 220 nm) |
| Infrared Transmittance [Product Introduction Material Comparison; Quartz JGS2] | Relatively Good (Relatively High Transmission at 2.7 μm) |
| Chemical Stability [Product Introduction Material Comparison; Quartz JGS2] | Excellent (Strong Acid/Alkali Resistance) |
| Mechanical Strength [Product Introduction Material Comparison; Quartz JGS2] | High |
| Main Applications [Product Introduction Material Comparison; Quartz JGS2] | Visible/Infrared Optics, Laser Windows |
| Material Type [Product Introduction Material Comparison; Borosilicate Glass BF33] | High-Borosilicate Glass (Containing Boron Oxide) |
| Main Constituents [Product Introduction Material Comparison; Borosilicate Glass BF33] | SiO₂ (Approximately 81%), B₂O₃ (Approximately 13%) |
| Hydroxyl Content [Product Introduction Material Comparison; Borosilicate Glass BF33] | Low (<10 ppm) |
| Thermal Expansion Coefficient [Product Introduction Material Comparison; Borosilicate Glass BF33] | 3.25 × 10⁻⁶ /K (Low Expansion) |
| Heat Resistance [Product Introduction Material Comparison; Borosilicate Glass BF33] | Relatively High (Softening Point Approximately 820°C) |
| Transmission Range [Product Introduction Material Comparison; Borosilicate Glass BF33] | 300 nm - 2500 nm |
| UV Transmittance [Product Introduction Material Comparison; Borosilicate Glass BF33] | Relatively Poor (Low Transmission below 300 nm) |
| Infrared Transmittance [Product Introduction Material Comparison; Borosilicate Glass BF33] | Good (Relatively High Transmission at 2.7 μm) |
| Chemical Stability [Product Introduction Material Comparison; Borosilicate Glass BF33] | Good (Acid/Alkali Resistant, but Weaker Than Quartz) |
| Mechanical Strength [Product Introduction Material Comparison; Borosilicate Glass BF33] | High |
| Main Applications [Product Introduction Material Comparison; Borosilicate Glass BF33] | Optical Windows, Laboratory Ware, Displays |
Applications
Optical Windows, Laboratory Ware, Displays
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Supplier Information
Jiangyin Jingmu Optoelectronic New Materials Co., Ltd. is a technology-oriented enterprise dedicated to semiconductor wafer material processing and epitaxial technology. With a decade of focus on semiconductor substrates, including SiC, sapphire, silicon, and third/fourth-generation materials like diamond, GaN, Ga2O3, AlN, it also provides optical wafers and carrier products. Equipped with advanced processing technologies such as cutting, grinding, polishing, laser processing, epitaxial coating, and wafer bonding, it collaborates with universities for R&D, offering customized solutions. Products are widely used in LED, power devices, RF, and optical communication.
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