Conductive Single-Crystal SiC Substrate
SiC Third-Generation Wide-Bandgap Group IV-IV1:1 C/Si Compound,Hardness Second to Diamond,High Thermal Conductivity/Breakdown Field.
Specification Snapshot
Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter
50.8mm-2 inch
Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter
100mm-4 inch
Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter
150mm-6 inch
Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter
200mm-8 inch
Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Thickness [Diameter: 50.8mm-2 inch]
350μm
Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Thickness [Diameter: 100mm-4 inch]
350μm
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Overview
SiC Third-Generation Wide-Bandgap Group IV-IV1:1 C/Si Compound,Hardness Second to Diamond,High Thermal Conductivity/Breakdown Field.
Specifications
| Parameter | Value |
|---|---|
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter | 50.8mm-2 inch |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter | 100mm-4 inch |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter | 150mm-6 inch |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Diameter | 200mm-8 inch |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Thickness [Diameter: 50.8mm-2 inch] | 350μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Thickness [Diameter: 100mm-4 inch] | 350μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Thickness [Diameter: 150mm-6 inch] | 350μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Thickness [Diameter: 200mm-8 inch] | 500μm |
| 4H-N Conductive Single-Crystal Silicon Carbide Substrate (2~8 Inches) - Surface Crystal Orientation | Off-Axis:4°toward <11-20>±0.5° |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Crystal Orientation [Diameter: 50.8mm-2 inch] | Parallel to <11-20>±1° |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Crystal Orientation [Diameter: 100mm-4 inch] | Parallel to <11-20>±1° |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Crystal Orientation [Diameter: 150mm-6 inch] | Parallel to <11-20>±1° |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Crystal Orientation [Diameter: 200mm-8 inch] | <1-100>±1° |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Length [Diameter: 50.8mm-2 inch] | 16.0mm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Length [Diameter: 100mm-4 inch] | 32.5mm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Length [Diameter: 150mm-6 inch] | 47.5mm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Primary Reference-Flat Length [Diameter: 200mm-8 inch] | Notch |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Secondary Reference-Flat Position [Diameter: 50.8mm-2 inch] | Silicon face up: 90.0˚ CW from Primary ± 5. |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Secondary Reference-Flat Position [Diameter: 100mm-4 inch] | Silicon face up: 90.0˚ CW from Primary ± 5. |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Secondary Reference-Flat Length [Diameter: 50.8mm-2 inch] | 8.0mm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Secondary Reference-Flat Length [Diameter: 100mm-4 inch] | 18.0mm |
| 4H-N Conductive Single-Crystal Silicon Carbide Substrate (2~8 Inches) - Resistivity | 0.014~0.028Ω•cm |
| 4H-N Conductive Single-Crystal Silicon Carbide Substrate (2~8 Inches) - Front Surface Condition | Si-Face:CMP,Ra<0.2nm |
| 4H-N Conductive Single-Crystal Silicon Carbide Substrate (2~8 Inches) - Back Surface Condition | C-Face:Optical Polish,Ra<0.5nm |
| 4H-N Conductive Single-Crystal Silicon Carbide Substrate (2~8 Inches) - Laser Marking Code Surface | Back side:C-Face |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Total Thickness Variation (TTV) [Diameter: 50.8mm-2 inch] | ≤10μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Total Thickness Variation (TTV) [Diameter: 100mm-4 inch] | ≤15μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Total Thickness Variation (TTV) [Diameter: 150mm-6 inch] | ≤15μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Total Thickness Variation (TTV) [Diameter: 200mm-8 inch] | ≤20μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Bow (BOW) [Diameter: 50.8mm-2 inch] | ≤25μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Bow (BOW) [Diameter: 100mm-4 inch] | ≤30μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Bow (BOW) [Diameter: 150mm-6 inch] | ≤40μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Bow (BOW) [Diameter: 200mm-8 inch] | ≤60μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Warp (WARP) [Diameter: 50.8mm-2 inch] | ≤30μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Warp (WARP) [Diameter: 100mm-4 inch] | ≤40μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Warp (WARP) [Diameter: 150mm-6 inch] | ≤60μm |
| Silicon Carbide 4H-N Conductive Single-Crystal Substrate (2~8 Inches) - Warp (WARP) [Diameter: 200mm-8 inch] | ≤80μm |
| 4H-N Conductive Single-Crystal Silicon Carbide Substrate (2~8 Inches) - Edge Exclusion | ≤3 mm |
| Silicon Carbide Single Crystal - Crystal Structure | Hexagonal Crystal |
| Silicon Carbide Single Crystal - Bandgap | 3.26eV |
| Silicon Carbide Single Crystal - Melting Point | 2730℃ |
| Silicon Carbide Single Crystal - Mohs Hardness | 9.2 mohs |
| Silicon Carbide Single Crystal - Thermal Conductivity | 4.9W·cm⁻¹·℃⁻¹ |
| Silicon Carbide Single Crystal - Thermal Expansion Coefficient | 4.7×10⁻⁶ |
| Silicon Carbide Single Crystal - Lattice Constant | a=0.3076 c=0.5048 |
| Silicon Carbide Single Crystal - Electron Mobility | 720ᵃ650ᶜ |
| Silicon Carbide Single Crystal - Breakdown Electric Field | 3.1 MV·cm⁻¹ |
| Silicon Carbide Single Crystal - JFM Index (Power) | 410 |
| Silicon Carbide Single Crystal - BFM Index (SW) | 290 |
| Silicon Carbide Single Crystal - BHFM Index (RF) | 34 |
| Silicon Carbide Single Crystal - Refractive Index | 2.6767~2.6480 |
Applications
New-Energy Vehicles:Drive Systems,Onboard Chargers(OBC),Onboard DC/DC and Offboard Chargers;For Example,Power Devices Made from4H-N Conductive SiC Wafers in EV Inverters Reduce Energy Consumption/Size,Accelerate Charging and Extend Range
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Supplier Information
Jiangyin Jingmu Optoelectronic New Materials Co., Ltd. is a technology-oriented enterprise dedicated to semiconductor wafer material processing and epitaxial technology. With a decade of focus on semiconductor substrates, including SiC, sapphire, silicon, and third/fourth-generation materials like diamond, GaN, Ga2O3, AlN, it also provides optical wafers and carrier products. Equipped with advanced processing technologies such as cutting, grinding, polishing, laser processing, epitaxial coating, and wafer bonding, it collaborates with universities for R&D, offering customized solutions. Products are widely used in LED, power devices, RF, and optical communication.
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