Quartz JGS1/JSG2/JGS3
Source Intro JSG1/JGS2/JGS3:Fused Quartz;JGS1 Far-/Deep-UV Synthetic,Bubble-/Impurity-Free/Uniform;JGS2 Ordinary UV Crystal Quartz,Economical/Best Value;JGS3 IR Vacuum-Fused Quartz.
Specification Snapshot
Quartz-Glass Wafer Substrate - Diameter
25.4mm
Quartz-Glass Wafer Substrate - Diameter
50.8 mm
Quartz-Glass Wafer Substrate - Diameter
100mm
Quartz-Glass Wafer Substrate - Diameter
150mm
Quartz-Glass Wafer Substrate - Diameter
200mm
Quartz-Glass Wafer Substrate - Diameter
300mm
Request a Quote
Download Datasheet
Overview
Source Intro JSG1/JGS2/JGS3:Fused Quartz;JGS1 Far-/Deep-UV Synthetic,Bubble-/Impurity-Free/Uniform;JGS2 Ordinary UV Crystal Quartz,Economical/Best Value;JGS3 IR Vacuum-Fused Quartz.
Specifications
| Parameter | Value |
|---|---|
| Quartz-Glass Wafer Substrate - Domestic Grade | Fused Silica: Domestic JGS1, JGS2, JGS3; Borosilicate Glass: Domestic BF33; YOFC Silica YS-1330 and Others |
| Quartz-Glass Wafer Substrate - Imported Grade | Germany Schott BF33, USA Corning 7980, Japan Ohara SK-1300 and Others |
| Quartz-Glass Wafer Substrate - Diameter | 25.4mm |
| Quartz-Glass Wafer Substrate - Diameter | 50.8 mm |
| Quartz-Glass Wafer Substrate - Diameter | 100mm |
| Quartz-Glass Wafer Substrate - Diameter | 150mm |
| Quartz-Glass Wafer Substrate - Diameter | 200mm |
| Quartz-Glass Wafer Substrate - Diameter | 300mm |
| Quartz-Glass Wafer Substrate - Thickness (Ultrathin Thickness) [Diameter: 25.4mm] | 150μm; 500μm |
| Quartz-Glass Wafer Substrate - Thickness (Ultrathin Thickness) [Diameter: 50.8 mm] | 150μm; 500μm |
| Quartz-Glass Wafer Substrate - Thickness (Ultrathin Thickness) [Diameter: 100mm] | 100μm; 500μm |
| Quartz-Glass Wafer Substrate - Thickness (Ultrathin Thickness) [Diameter: 150mm] | 200μm; 500μm; 725μm; 1000μm |
| Quartz-Glass Wafer Substrate - Thickness (Ultrathin Thickness) [Diameter: 200mm] | 200μm; 725μm; 1000μm |
| Quartz-Glass Wafer Substrate - Thickness (Ultrathin Thickness) [Diameter: 300mm] | 300μm; 725μm; 1000μm |
| Quartz-Glass Wafer Substrate - Surface Roughness | Double Sides Polished, Ra< 1.0nm |
| Quartz-Glass Wafer Substrate - Orientation - Flat [Diameter: 25.4mm] | 8mm |
| Quartz-Glass Wafer Substrate - Orientation - Flat [Diameter: 50.8 mm] | 16mm |
| Quartz-Glass Wafer Substrate - Orientation - Flat [Diameter: 100mm] | 30mm |
| Quartz-Glass Wafer Substrate - Orientation - Flat [Diameter: 150mm] | 47.5mm |
| Quartz-Glass Wafer Substrate - Orientation - Notch [Diameter: 150mm] | Semi-Notch |
| Quartz-Glass Wafer Substrate - Orientation - Notch [Diameter: 200mm] | Semi-Notch |
| Quartz-Glass Wafer Substrate - Orientation - Notch [Diameter: 300mm] | Semi-Notch |
| Quartz-Glass Wafer Substrate - Surface Finish | S/D 60/40, S/D 40/20 |
| Quartz-Glass Wafer Substrate - Edge Exclusion | ≤ 2mm |
| Quartz-Glass Wafer Substrate - Surface Figure [Diameter: 25.4mm] | TTV< 2μm |
| Quartz-Glass Wafer Substrate - Surface Figure [Diameter: 50.8 mm] | TTV< 2μm |
| Quartz-Glass Wafer Substrate - Surface Figure [Diameter: 100mm] | TTV< 2μm |
| Quartz-Glass Wafer Substrate - Surface Figure [Diameter: 150mm] | TTV< 2μm |
| Quartz-Glass Wafer Substrate - Surface Figure [Diameter: 200mm] | TTV< 2μm |
| Quartz-Glass Wafer Substrate - Surface Figure [Diameter: 300mm] | TTV< 2μm |
| Transmission Range [Optical Parameter Comparison; Quartz JGS1] | 0.17~2.10μm |
| Transmission Range [Optical Parameter Comparison; Quartz JGS1] | Average Transmission >90% |
| OH- Content [Optical Parameter Comparison; Quartz JGS1] | 1200ppm |
| Fluorescence (Excitation Wavelength 254nm) [Optical parameter comparison; Quartz JGS1; Excitation wavelength254nm] | Virtually No Fluorescence |
| Impurity Content [Optical Parameter Comparison; Quartz JGS1] | 5ppm |
| Birefringence Constant [Optical Parameter Comparison; Quartz JGS1] | 2-4nm/cm |
| Melting Method [Optical Parameter Comparison; Quartz JGS1] | Synthetic CVD |
| Main Applications [Optical Parameter Comparison; Quartz JGS1] | UV Lithography, UV Spectrometers, UV Microscopes, Deep-UV Windows, etc. |
| Transmission Range [Optical Parameter Comparison; Quartz JGS2] | 0.26~2.10μm |
| Transmission Range [Optical Parameter Comparison; Quartz JGS2] | Average Transmittance >85% |
| OH- Content [Optical Parameter Comparison; Quartz JGS2] | 150ppm |
| Fluorescence (Excitation Wavelength 254nm) [Optical parameter comparison; Quartz JGS2; Excitation wavelength254nm] | Strong V-B |
| Impurity Content [Optical Parameter Comparison; Quartz JGS2] | 20-40ppm |
| Birefringence Constant [Optical Parameter Comparison; Quartz JGS2] | 4-6nm/cm |
| Melting Method [Optical Parameter Comparison; Quartz JGS2] | Oxyhydrogen Fusion |
| Main Applications [Optical Parameter Comparison; Quartz JGS2] | Semiconductor and High-Temperature Windows; General UV-Visible Experiments, Optical Substrates, etc. |
| Transmission Range [Optical Parameter Comparison; Quartz JGS3] | 0.185~3.50μm |
| Transmission Range [Optical Parameter Comparison; Quartz JGS3] | Average Transmittance >85% |
| OH- Content [Optical Parameter Comparison; Quartz JGS3] | 5ppm |
| Fluorescence (Excitation Wavelength 254nm) [Optical parameter comparison; Quartz JGS3; Excitation wavelength254nm] | Strong V-B |
| Impurity Content [Optical Parameter Comparison; Quartz JGS3] | 40-50ppm |
| Birefringence Constant [Optical Parameter Comparison; Quartz JGS3] | 4-10nm/cm |
| Melting Method [Optical Parameter Comparison; Quartz JGS3] | Electric Fusion |
| Main Applications [Optical Parameter Comparison; Quartz JGS3] | FTIR, Infrared Temperature Measurement Windows, Thermal Imaging, Infrared Sensors, etc. |
Datasheet
Please provide your email to download the datasheet.
Your name
Email Address
Invalid email format. Please try again.
Send Request
Supplier Information
Jiangyin Jingmu Optoelectronic New Materials Co., Ltd. is a technology-oriented enterprise dedicated to semiconductor wafer material processing and epitaxial technology. With a decade of focus on semiconductor substrates, including SiC, sapphire, silicon, and third/fourth-generation materials like diamond, GaN, Ga2O3, AlN, it also provides optical wafers and carrier products. Equipped with advanced processing technologies such as cutting, grinding, polishing, laser processing, epitaxial coating, and wafer bonding, it collaborates with universities for R&D, offering customized solutions. Products are widely used in LED, power devices, RF, and optical communication.
Contact Us
Loading...
GetExperimental Plan
Name
Phone
+86
Organization
Use Case

Global Photonics Products
Database Platform
Database Platform
With 16 years of experience, we provide high-quality products and services to universities, research institutes, and industry.
50+ Detailed Categories · 3,000+ Global Brands · 100,000+ Photonics Products
1 Million+
In-depth analysis of professional academic resources in photonics
300,000
ProductsDatasheets Available Free
We will keep your personal information strictly confidential.
Product Quote
+86
* Select the quoting party:
By submitting, you agree to the User Service Agreement and Privacy Policy