976nm Edge-Emitting Laser Epitaxial Wafer
Specification Snapshot
Threshold Current [CW: >25W; Typical Value]
<2A
Operating Voltage [CW: >25W; Typical Value]
1.7V
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Specifications
| Parameter | Value |
|---|---|
| Threshold Current [CW: >25W; Typical Value] | <2A |
| Operating Voltage [CW: >25W; Typical Value] | 1.7V |
| Slope Efficiency [CW: >25W; Typical Value] | >1.05W/A |
Applications
Fiber Pumping; Medical Beauty; Laser Aiming; Laser Detection
Datasheet
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Supplier Information
Founded in 2016 and located in Pizhou, Jiangsu, the company is a national high-tech enterprise, a national specialized 'Little Giant' enterprise, and a potential unicorn enterprise. It focuses on the research and manufacturing of compound semiconductor optoelectronic epitaxial wafers, utilizing MOCVD, lithography, and nanoimprint technologies to produce InP- and GaAs-based semiconductor epitaxial wafers, which are widely used in laser communications, laser sensing, laser processing, RF power amplifiers, etc. The company has clean workshops, multiple production lines, and a technical team including 16 PhDs and 18 masters. It has accumulated over 50 patents and won multiple national and provincial innovation and entrepreneurship awards.
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