261 nm Continuous-Wave Laser
Uses a 444nm semiconductor laser as the pump source, directly combining a laser crystal with nonlinear optical crystal frequency doubling to produce 261nm continuous-wave ultraviolet laser output.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Center wavelength | 261 nm |
| Output Power | 10-100、100-500、500-1000、1000-2000 mW |
| Output Mode | Continuous |
| Beam quality M² | M²<1.3 |
| Spot Ellipticity | >90% |
| Beam diameter | 0.5-3 mm Adjustable, Customizable Line Spot |
| Divergence angle | 0.5-3 mrad adjustable |
| Power stability [RMS] | RMS<1% |
| Beam Waist Position | Optical Output Aperture |
| Polarization Extinction ratio | >100:1 |
| Cooling method | Water cooling |
| Laser head Weight | 10 kg |
| Startup Stabilization Time | 20-40 min |
| Operating lifetime | 10000 h |
| Power supply | 50-60 Hz, 100-240 VAC |
| Warranty period | 1 year |
| Laser Dimensions | 630 mm×274 mm×188 mm |
| Control Method | Compatible software enables temperature control and power adjustment |
| Operating environment Temperature | 20~30°C |
| Operating environment Humidity Range | <40% |
| Storage temperature | 15~35°C |
Applications
Key Features
Datasheet
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