Elite Etch System
The Elite Etch System is a high-precision etching device designed for advanced applications in microfabrication and semiconductor processing.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Etching Machine Composition | Height:300mm(13in),Width:190mm(7.5in),Depth:305mm(12in) |
| Bottle Assembly | Height:254mm(10in),Width:280mm(11in),Depth:127mm(5in) |
| Weight | 16kg(35lb) |
| Power | 90-250VAC,50/60Hz(4amp) |
| Openable Copper Wire Encapsulation | Up to 0.8mil copper wire |
| Acid Temperature Control Range | 10°C to 100°C |
| Acid Temperature Setting | Set temperature ±1°C ±1% |
| Etching Chamber (Max) | 22mm×22mm(30mm diagonal) |
| Acid Options | Phosphoric acid,mixed phosphoric acid,nitric acid,sulfuric acid/concentrated sulfuric acid |
| Mixed Acid Ratio | (Phosphoric acid:nitric acid)9:1,6:1,5:1,4:1,7:2,3:1,5:2,2:1,1:1,1:2,1:3,1:4,1:5 |
| Etching Chamber Rinse Options | Nitric acid |
| Etching Chamber Rinse Options | phosphoric acid |
| Etching Chamber Rinse Options | mixed acid |
| Etching Chamber Rinse Options | or no rinse |
| Etching Time | 1s-2400s,adjustable in 1s increments |
| Etching Flow Rate Options | 12ml/min adjustable (for all acid mixtures) |
| Operation Program Storage | 100 programs,easy to store and retrieve |
| Certification Standards | RoHS,CE,SEMI S-2,SEMI S-2.93 |
Applications
Key Features
Datasheet
Supplier Information
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