IM4000 II & ArBlade 5000
IM4000 II and ArBlade 5000 are advanced ion milling systems designed for precise surface preparation and analysis. They offer high-speed milling capabilities and versatile applications for various materials.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Gas Source | 氩气 |
| Gas Flow Control Method | 质量流量控制 |
| Acceleration Voltage | IM4000 II: 0.0~6.0kV, ArBlade 5000: 0.0~8.0kV |
| Vacuum System | 涡轮分子泵(67L/S)+机械泵(135L/min(50Hz), 162L/min(60Hz)) |
| Main Unit Dimensions | IM4000 II: 616(W)×736(D)×312(H)mm, ArBlade 5000: 619(W)×736(D)×312(H)mm |
| Weight | 主机53kg+机械泵30kg |
| Maximum Milling Speed (Si Wafer) | IM4000 II: 500μm/h以上, ArBlade 5000: 1mm/h以上 |
| Maximum Sample Size | Φ50×25(H)mm |
| Sample Movement Range | X:0~±5mm |
| Ion Beam Intermittent Processing Function | 离子束间歇加工ION/OFF时间设定范围1秒~59分59秒 |
| Swing Angle | ±60°~±90° |
| Wide Range Cross-Section Milling Function | ArBlade 5000: 标配, 加工宽度8mm |
| Processing Range | Φ32mm |
| Rotation/Oscillation Speed | 1rpm, 25rpm |
| Low Temperature Control Function | 通过液氮间接冷却样品, 温度设定范围0°~100°C |
| Super Hard Shield | 超硬遮挡板的耐磨性是标准遮挡板的2倍左右(不含钻) |
| Microscope for Process Observation | 放大倍率15~100倍双目型, 三目型(可装CCD) |
| Room Temperature | 15~30°C |
| Humidity | ≤70%RH(None结露) |
| Power Supply | AC100~240V(±10%), 50/60Hz, 1.5kVA, 3P电源线 |
| Grounding | D种接地(100Ω以下) |
Applications
Key Features
Datasheet
Supplier Information
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