SRII-300
The SRII-300 medium current ion implanter is designed for advanced applications in storage, logic, memory, power, and CIS. It features precise angle control, comprehensive range measurement, and high production design.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Dimensions | 7.52×3.19×3.08m |
| Wafer Size | 200mm/300mm |
| Species | B/P/As (expandable) |
| Application | Logic/Memory/Power/CIS etc. |
| Energy Range | 2-900keV |
| Energy Accuracy | ±1% |
| Dose Range | 1E11-1E16 ions/cm² |
| Dose Uniformity | 0.5% |
| Dose Repeatability | 0.5% |
| Autotune Success | 95% |
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Datasheet
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