Sapphire Lapping Slurry
(1) The product, used together with a resin copper plate, achieves a high removal rate for sapphire wafers while ensuring wafer surface quality; (2) Good cleaning performance and more environmentally friendly; (3) Strict quality control ensures product quality consistency and stability; (4) The diamond grit size can be adjusted according to customer requirements.
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Overview
(1) The product, used together with a resin copper plate, achieves a high removal rate for sapphire wafers while ensuring wafer surface quality; (2) Good cleaning performance and more environmentally friendly; (3) Strict quality control ensures product quality consistency and stability; (4) The diamond grit size can be adjusted according to customer requirements.
Specifications
| Parameter | Value |
|---|---|
| Sapphire Particle Size Specification | D50=4-6μm |
| Sapphire Abrasive Type | Polycrystalline-like diamond / polycrystalline diamond |
| Sapphire Property | Shake well; alcohol-based, oil-based carriers |
| Sapphire Particle Size Specification | D50=30-40μm |
| Sapphire Abrasive Type | Polycrystalline-like diamond |
| Sapphire Property | Shake well; alcohol-based carrier |
Applications
This product is mainly used for thinning of super-hard materials such as sapphire substrates.
Datasheet
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Supplier Information
Henan Union Precision Material Co., Ltd., founded on June 26, 2002, is a high-tech enterprise dedicated to R&D, production and sales of precision grinding and polishing materials and high-end products. It offers fine abrasives, fluid abrasives, etc., and provides total solutions for semiconductors, integrated circuits, etc., serving precision processing such as semiconductor wafers, photovoltaic silicon slicing diamond wire, consumer electronics polishing, and sapphire LED substrate grinding. The company has passed ISO9001, ISO14001, ISO45001, and is a core competitive supplier in the superhard material industry, trusted for its R&D, quality and service.
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