Optical Measurement Software

Model: 1500A, 2000A, 3000A Wavelength Range: 530~750nm, 380~760nm (optional) Spot Diameter: φ1mm, φ0.3mm (optional)

The ULVAC膜厚测量仪 is a high-precision optical measurement device designed for thin film thickness analysis, offering automated measurement capabilities and advanced control systems.

Operating Voltage: Unknown Power: Unknown Accuracy: Unknown

This product appears to be a high-precision optical device, likely used for advanced measurement or manufacturing processes.

Measurement Principle: Spectral Reflectance Film Thickness Range: 15nm-75μm Wavelength Range: 380-1050nm

The Filmetrics F3-CS is a compact benchtop thin-film thickness measurement system based on spectral reflectance. Light reflected from the top and bottom interfaces of a film stack generates an interference spectrum, which is captured by the built-in spectrometer and fitted by the FILMeasure software against an extensive material library to report film thickness and optical constants (n and k) in under a second. The top-loading sample port with a flip-up cover makes measurement fast and repeatable, while the non-contact optical technique never touches or damages the sample. Covering a typical thickness range of 15nm to 75μm, the F3-CS handles dielectrics, photoresists, polymers and other transparent or semi-transparent films, offering an affordable, easy-to-use alternative to spectroscopic ellipsometers for R&D, failure analysis and production quality control.

Measurement Principle: Spectral reflectance Thickness Measurement Range: 15Å–70µm Wavelength Range: 380–1050nm

A compact benchtop optical metrology system designed for fast, non-contact and non-destructive thickness measurement of transparent and semi-transparent thin films. Based on the image, the instrument integrates a manual sample stage with a vacuum chuck, an enclosed optical measurement head protected by a flip-up cover, and a single-box architecture that is easy to deploy in laboratories, cleanrooms and production lines. Working on the principle of spectral reflectance, the system illuminates the sample with broadband light, collects the reflected interference spectrum with a built-in spectrometer, and calculates film thickness by fitting the spectrum against a materials library of refractive index (n & k) data. It measures single-layer and multilayer stacks such as oxides, nitrides, photoresists, ITO, anti-reflection coatings and polymer films on wafers, glass or metal substrates, delivering results in seconds without any sample preparation.