SRII Ion Implanter Series
The SRII Ion Implanter Series offers advanced ion implantation solutions for semiconductor manufacturing, featuring high precision, energy efficiency, and compatibility with various wafer sizes.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Product | SRII-60, SRII-200, SRII-1.5M, SRII-4.5M SiC, SRII-200 SiC, SRII-300 SiC, SRII-4.5M, SRII-8M, SRII-300 |
| Dimensions | 6.48×2.76×3.06m, 6×3×3.06m, 9.2×4.2×3m, 8.03×4.6×2.86m, 6×3×3.06m, 7.52×3.19×3.08m, 8.9×4.2×2.86m, 9.7×4.4×2.86m, 7.52×3.19×3.08m |
| Wafer Size | 200mm/300mm, 150mm/200mm |
| Species | H/He, Al/N/B/P/As, B/P/As |
| Application | SOI materials, semiconductor devices, power devices, SiC, logic/memory/power/CIS |
| Energy Range | 1-60keV (option 80keV), 5-200keV, 1.5MeV, 40-4500keV, 2-900keV, 40-8000keV |
| Energy Accuracy | ±1% |
| Dose Range | 5E14-1E17 ions/cm², 5E10-1E15 ions/cm², 1E13-5E16 ions/cm², 1E11-1E16 ions/cm² |
| Dose Uniformity | 0.7%-1%, 0.5% |
| Dose Repeatability | 0.7%-1%, 0.5% |
| Max Wafer Temperature | 600°C |
| Autotune Success | 92%, 95% |
Applications
Key Features
Datasheet
Supplier Information
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