SRII-300
The SRII-300 medium current ion implanter is developed by SRI Intelligent Technology, featuring advanced scanning technology and high precision control. It is suitable for applications such as storage, CIS, and power devices.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Dimensions | 7.52×3.19×3.08m |
| Wafer Size | 200mm/300mm |
| Species | B/P/As (expandable) |
| Application | Logic/Memory/Power/CIS etc. |
| Energy Range | 2-900keV |
| Energy Accuracy | ±1% |
| Dose Range | 1E11-1E16 ions/cm² |
| Dose Uniformity | 0.5% |
| Dose Repeatability | 0.5% |
| Autotune Success | 95% |
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