SRII Ion Implanter Series
The SRII Ion Implanter Series offers advanced ion implantation solutions for semiconductor manufacturing, featuring high precision, energy control, and compatibility with various wafer sizes.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Dimensions SRII-60 | 6.48×2.76×3.06m |
| Dimensions SRII-200 | 6×3×3.06m |
| Dimensions SRII-1.5M | 9.2×4.2×3m |
| Dimensions SRII-4.5M | 8.9×4.2×2.86m |
| Dimensions SRII-8M | 9.7×4.4×2.86m |
| Dimensions SRII-300 | 7.52×3.19×3.08m |
| Dimensions SRII-4.5M SiC | 8.03×4.6×2.86m |
| Dimensions SRII-200 SiC | 6×3×3.06m |
| Dimensions SRII-300 SiC | 7.52×3.19×3.08m |
| Wafer Size | 200mm/300mm |
| Species | H/He, B/P/As, Al/N/B/P/As |
| Application | SOI materials, logic/memory/power/CIS, SiC |
| Energy Range | 0.2-4500keV |
| Energy Accuracy | ±1% |
| Dose Range | 5E10-1E17 ions/cm² |
| Dose Uniformity | 0.5%-1% |
| Dose Repeatability | 0.5%-1% |
| Max Wafer Temperature | 600°C |
| Autotune Success | 92%-95% |
Applications
Key Features
Datasheet
Supplier Information
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