P Series ALD Platform
The P Series is designed for industrial-scale atomic layer deposition (ALD) production, offering high throughput and uniformity for batch processing.
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Overview
The P Series is designed for industrial-scale atomic layer deposition (ALD) production, offering high throughput and uniformity for batch processing.
Specifications
| Parameter | Value |
|---|---|
| Process Type | Thermal ALD |
| Process Temperature Range | 25-550°C |
| Substrate Type | Silicon wafers, glass, metal materials, polymer 3D substrates |
| Vacuum Chamber Size | ø400mm (P400A), ø800mm (P800), ø1700mm (P1500) |
| Reaction Chamber Loading and Size | 240×240×720mm (P400A), 550×310×700mm (P800), 1300×2400×750mm (P1500) |
| Precursor Volume | 5 standard containers (P400A, P800), 10 standard containers (P1500) |
| Equipment Dimensions | 2400×930×2420mm (P400A), 3200×1340×2460mm (P800), 6195×2480×2600mm (P1500) |
Applications
1. Industrial-scale ALD production 2. Batch processing for various substrates and thin films 3. Research and development to full-scale production
Key Features
1. Designed for batch processing with high uniformity 2. Supports various substrates and thin films 3. Equipped with advanced precursor filtration system 4. Multiple reaction chambers for flexible operation
Datasheet
Product Datasheet
PDF
Supplier Information
<p>Qingdao Sirui Intelligent Technology Co., Ltd. was established in 2018 and is headquartered in Qingdao, China, with R&D centers in Beijing and Shanghai. Sirui Intelligent mainly focuses on the R&D, production and sales of key semiconductor front-end process equipment, providing system equipment products and technical service solutions with independently controllable core key technologies. The company's products include atomic layer deposition (ALD) equipment and ion implantation (IMP) equipment, which are widely used in many high-precision fields such as integrated circuits, third-generation semiconductors, new energy, optics, and parts coating.</p>
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