P Series ALD Platform
The P Series ALD platform is designed for industrial-scale atomic layer deposition, offering mature technology and ideal tools for batch production. It ensures uniformity and flexibility for different substrates and thicknesses.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Process Type | Thermal ALD |
| Process Temperature Range | 25-550°C |
| Substrate Type | Silicon wafers, glass, metal materials, polymer and 3D substrates |
| Vacuum Chamber Size | Φ400mm (P400A), Φ800mm (P800), Φ1700mm (P1500) |
| Reaction Chamber Loading and Size | 240×240×720mm with 23 shelf cassette (P400A), 550×310×700mm (P800), 1300×2400×750mm (P1500) |
| Precursor Volume | 5 standard cylinders (P400A, P800), 10 standard cylinders (P1500) |
| Main Equipment Dimensions | 2400×930×2420mm (P400A), 3200×1340×2460mm (P800), 6195×2480×2600mm (P1500) |
Applications
Key Features
Datasheet
Supplier Information
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