Silicon-Carbide-Based GaN Epitaxial HEMT

Silicon-Carbide-Based GaN Epitaxial HEMT

Supplier
Jmwafer
Category
Optical Crystals
Origin
China

GaN-on-SiC HEMT Epitaxy Combines GaN High-Frequency/Power with SiC Thermal Conductivity by Growing GaN Films on SiC.

Specification Snapshot
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter
2 inch - 50.8mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter
4 inch - 100mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter
6 inch - 150mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 2 inch - 50.8mm]
500μm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 4 inch - 100mm]
500μm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 6 inch - 150mm]
500μm
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Overview

GaN-on-SiC HEMT Epitaxy Combines GaN High-Frequency/Power with SiC Thermal Conductivity by Growing GaN Films on SiC.

Specifications

ParameterValue
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter2 inch - 50.8mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter4 inch - 100mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter6 inch - 150mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 2 inch - 50.8mm]500μm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 4 inch - 100mm]500μm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 6 inch - 150mm]500μm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Crystal Orientation{0001}
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Resistivity≥1E7 Ω·cm

Applications

5G RF Power Amplifiers;Radar;Satellite High-Power Amplifiers;Efficient Converters,EV Chargers/Industrial Motors;Base-Station RF Front Ends

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Supplier Information

Jm
Jmwafer
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Jiangyin Jingmu Optoelectronic New Materials Co., Ltd. is a technology-oriented enterprise dedicated to semiconductor wafer material processing and epitaxial technology. With a decade of focus on semiconductor substrates, including SiC, sapphire, silicon, and third/fourth-generation materials like diamond, GaN, Ga2O3, AlN, it also provides optical wafers and carrier products. Equipped with advanced processing technologies such as cutting, grinding, polishing, laser processing, epitaxial coating, and wafer bonding, it collaborates with universities for R&D, offering customized solutions. Products are widely used in LED, power devices, RF, and optical communication.

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Silicon-Carbide-Based GaN Epitaxial HEMT
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