Silicon-Carbide-Based GaN Epitaxial HEMT
GaN-on-SiC HEMT Epitaxy Combines GaN High-Frequency/Power with SiC Thermal Conductivity by Growing GaN Films on SiC.
Specification Snapshot
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter
2 inch - 50.8mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter
4 inch - 100mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter
6 inch - 150mm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 2 inch - 50.8mm]
500μm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 4 inch - 100mm]
500μm
Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 6 inch - 150mm]
500μm
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Overview
GaN-on-SiC HEMT Epitaxy Combines GaN High-Frequency/Power with SiC Thermal Conductivity by Growing GaN Films on SiC.
Specifications
| Parameter | Value |
|---|---|
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter | 2 inch - 50.8mm |
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter | 4 inch - 100mm |
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Substrate Diameter | 6 inch - 150mm |
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 2 inch - 50.8mm] | 500μm |
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 4 inch - 100mm] | 500μm |
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Thickness [Substrate diameter: 6 inch - 150mm] | 500μm |
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Crystal Orientation | {0001} |
| Silicon-Carbide-Based GaN HEMT Epitaxial Substrate (2~6 Inches) - Silicon Carbide Substrate Resistivity | ≥1E7 Ω·cm |
Applications
5G RF Power Amplifiers;Radar;Satellite High-Power Amplifiers;Efficient Converters,EV Chargers/Industrial Motors;Base-Station RF Front Ends
Datasheet
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Supplier Information
Jiangyin Jingmu Optoelectronic New Materials Co., Ltd. is a technology-oriented enterprise dedicated to semiconductor wafer material processing and epitaxial technology. With a decade of focus on semiconductor substrates, including SiC, sapphire, silicon, and third/fourth-generation materials like diamond, GaN, Ga2O3, AlN, it also provides optical wafers and carrier products. Equipped with advanced processing technologies such as cutting, grinding, polishing, laser processing, epitaxial coating, and wafer bonding, it collaborates with universities for R&D, offering customized solutions. Products are widely used in LED, power devices, RF, and optical communication.
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