Sapphire Substrate
Sapphire substrate material is used for epitaxial growth. Its excellent stability supports high-temperature growth processes, while high mechanical strength makes it easy to handle and clean. Most processes therefore generally use sapphire substrates. As an excellent substrate, sapphire is increasingly used for epitaxial growth of new semiconductor materials, such as fourth-generation wide-bandgap gallium oxide.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Dimensions [Diameter Tolerance ±0.05mm] | 6 Inches (150/159mm)/4 Inches (100/104mm) |
| Thickness [Thickness Tolerance ±0.002mm] | 1mm/0.7mm |
| Parallelism | 10” |
| Thickness Uniformity [25pcs] | <2μm@25pcs |
| Surface Finish | 80/50 |
| Surface Flatness [632.8mm] | PV：RMS≤1/4λ@632.8mm |
| Coating | Uncoated |
| Packaging | Tray Packaging or Clean Cassette Packaging |
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Key Features
Datasheet
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Supplier Information
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