Quantitative Phase Resolution Target OTRQP25-255

Quantitative Phase Resolution Target OTRQP25-255

Supplier
Jcoptix
Part Number
OTRQP25-255
Category
Optical Inspection
Origin
China

JCOPTIX quantitative-phase resolution targets use UV fused silica and precision etching for quantitative-phase imaging tests. The same artifact compares different systems/techniques and their stability. AFM structure-height/depth results at requested positions are available. Custom ranges/heights/depths are supported; contact technical support. Quantitative-phase resolution targets. Models: OTRQP25-55, OTRQP25-110, OTRQP25-165, OTRQP25-220, OTRQP25-255, OTRQP25-M50280. Size 25 mm × 25 mm; positive/negative patterns; resolution USAF1951 2/1-11/3; single/multiple heights. JCOPTIX targets measure 25 mm × 25 mm, thickness 1 mm, and can contain both positive/negative patterns over USAF1951 2/1-11/3. Single heights are 55 nm, 110 nm, 165 nm, 220 nm, 255 nm; multiple heights are 50 nm, 100 nm, 150 nm, 200 nm, 250 nm, 280 nm. Contact support for customization. Technical notes: measured examples/reference tables, not measurements promised for every model/item. Targets measure 25 mm × 25 mm, thickness 1 mm, with both pattern polarities and USAF1951 2/1-11/3 resolution; Figures 1 and 2 show patterns. Custom ranges/heights/depths are available. Figure 1. Pattern layout. Figure 2. Optical-microscope photograph. The same artifact compares quantitative-phase systems/techniques and stability. Tables 1 and 2 show selected measured heights; AFM results at specified positions can be provided. Table 1. AFM measurements of single-height targets. Height in nm/position: 2um LS, USAF 4-1, USAF 6-1, USAF 8-1, USAF 10-1, USAF 11-3. Columns are target, six AFM readings, min, max, average. 110 | 116.935| 118.389 | 120.838 | 118.699 | 114.466 | 119.366 | 114.466 | 120.838 | 118.116 220 | 222.485 | 213.716 | 218.213 | 217.517 | 220.504 | 223.184 | 213.716 | 223.184 | 219.27 Table 2. Measured multilevel steps. Columns: target height nm, position, profilometer height nm, average nm. 50 | center| 49.45 | 53.12 50 | top | 54.94 | 53.12 50 | bottom | 54.97 | 53.12 100 | center | 97.72 | 95.86 100 | top | 96.13 | 95.86 100 | bottom | 93.74 | 95.86 150 | center | 153.41 | 155.69 150 | top | 155.55 | 155.69 150 | bottom | 158.11 | 155.69 200 | center | 201.36 | 204.69 200 | top | 203.02 | 204.69 200 | bottom | 209.7 | 204.69 250 | center | 248.5 | 245.22 250 | top | 248.64 | 245.22 250 | bottom | 238.53 | 245.22 280 | center | 279.87 | 284.47 280 | top | 278.64 | 284.47 280 | bottom | 294.89 | 284.47 Table 3 lists USAF 1951 group/element resolutions, calculated by Resolution=2^(Group+(Element-1)/6). Table 4 lists USAF 1951 individual linewidths, calculated by Width=1/(2×Resolution). These USAF 1951 targets use standard formulas or Tables 3 and 4 for linewidth/resolution. Figure 3 shows electron-microscope measurements with linewidth error below 15%. Figure 3. SEM measurement results. Table 3. USAF 1951 line-pair resolution, lp/mm. Element number versus group number: 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 1 | 4 | 8 | 16 | 32 | 64 | 128 | 256 | 512 | 1024 | 2048 2 | 4.4898 | 8.9797 | 17.9594 | 35.9188 | 71.8376 | 143.6751 | 286.85 | 573.7 | 1147.401 | 2294.802 3 | 5.0397 | 10.0794 | 20.1587 | 40.3175 | 80.6349 | 161.2699 | 322.54 | 645.08 | 1290.159 | 2580.318 4 | 5.6569 | 11.3137 | 22.6274 | 45.2548 | 90.5097 | 181.0193 | 362.039 | 724.077 | 1448.154 | 2896.309 5 | 6.3496 | 12.6992 | 25.3984 | 50.7968 | 101.5937 | 203.1873 | 406.375 | 812.749 | 1625.498 | 3250.997 6 | 7.1272 | 14.2544 | 28.5088 | 57.0175 | 114.035 | 228.0701 | 456.14 | 912.28 | 1824.561 | 3649.122 Table 4. USAF 1951 individual linewidth, μm. Element number versus group number: 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 1 | 125 | 62.5 | 31.25 | 15.63 | 7.81 | 3.91 | 1.953 | 0.977 | 0.488 | 0.244 2 | 111.36 | 55.68 | 27.84 | 13.92 | 6.96 | 3.48 | 1.743 | 0.872 | 0.436 | 0.218 3 | 99.21 | 49.61 | 24.8 | 12.4 | 6.2 | 3.1 | 1.55 | 0.775 | 0.387 | 0.194 4 | 88.39 | 44.19 | 22.1 | 11.05 | 5.52 | 2.76 | 1.381 | 0.69 | 0.345 | 0.173 5 | 78.75 | 39.37 | 19.69 | 9.84 | 4.92 | 2.46 | 1.23 | 0.615 | 0.308 | 0.154 6 | 70.15 | 35.08 | 17.54 | 8.77 | 4.38 | 2.19 | 1.099 | 0.55 | 0.275 | 0.137

Specification Snapshot
Dimensions
25 mm × 25 mm
Thickness
1 mm
Height
255 nm
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Overview

JCOPTIX quantitative-phase resolution targets use UV fused silica and precision etching for quantitative-phase imaging tests. The same artifact compares different systems/techniques and their stability. AFM structure-height/depth results at requested positions are available. Custom ranges/heights/depths are supported; contact technical support. Quantitative-phase resolution targets. Models: OTRQP25-55, OTRQP25-110, OTRQP25-165, OTRQP25-220, OTRQP25-255, OTRQP25-M50280. Size 25 mm × 25 mm; positive/negative patterns; resolution USAF1951 2/1-11/3; single/multiple heights. JCOPTIX targets measure 25 mm × 25 mm, thickness 1 mm, and can contain both positive/negative patterns over USAF1951 2/1-11/3. Single heights are 55 nm, 110 nm, 165 nm, 220 nm, 255 nm; multiple heights are 50 nm, 100 nm, 150 nm, 200 nm, 250 nm, 280 nm. Contact support for customization. Technical notes: measured examples/reference tables, not measurements promised for every model/item. Targets measure 25 mm × 25 mm, thickness 1 mm, with both pattern polarities and USAF1951 2/1-11/3 resolution; Figures 1 and 2 show patterns. Custom ranges/heights/depths are available. Figure 1. Pattern layout. Figure 2. Optical-microscope photograph. The same artifact compares quantitative-phase systems/techniques and stability. Tables 1 and 2 show selected measured heights; AFM results at specified positions can be provided. Table 1. AFM measurements of single-height targets. Height in nm/position: 2um LS, USAF 4-1, USAF 6-1, USAF 8-1, USAF 10-1, USAF 11-3. Columns are target, six AFM readings, min, max, average. 110 | 116.935| 118.389 | 120.838 | 118.699 | 114.466 | 119.366 | 114.466 | 120.838 | 118.116 220 | 222.485 | 213.716 | 218.213 | 217.517 | 220.504 | 223.184 | 213.716 | 223.184 | 219.27 Table 2. Measured multilevel steps. Columns: target height nm, position, profilometer height nm, average nm. 50 | center| 49.45 | 53.12 50 | top | 54.94 | 53.12 50 | bottom | 54.97 | 53.12 100 | center | 97.72 | 95.86 100 | top | 96.13 | 95.86 100 | bottom | 93.74 | 95.86 150 | center | 153.41 | 155.69 150 | top | 155.55 | 155.69 150 | bottom | 158.11 | 155.69 200 | center | 201.36 | 204.69 200 | top | 203.02 | 204.69 200 | bottom | 209.7 | 204.69 250 | center | 248.5 | 245.22 250 | top | 248.64 | 245.22 250 | bottom | 238.53 | 245.22 280 | center | 279.87 | 284.47 280 | top | 278.64 | 284.47 280 | bottom | 294.89 | 284.47 Table 3 lists USAF 1951 group/element resolutions, calculated by Resolution=2^(Group+(Element-1)/6). Table 4 lists USAF 1951 individual linewidths, calculated by Width=1/(2×Resolution). These USAF 1951 targets use standard formulas or Tables 3 and 4 for linewidth/resolution. Figure 3 shows electron-microscope measurements with linewidth error below 15%. Figure 3. SEM measurement results. Table 3. USAF 1951 line-pair resolution, lp/mm. Element number versus group number: 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 1 | 4 | 8 | 16 | 32 | 64 | 128 | 256 | 512 | 1024 | 2048 2 | 4.4898 | 8.9797 | 17.9594 | 35.9188 | 71.8376 | 143.6751 | 286.85 | 573.7 | 1147.401 | 2294.802 3 | 5.0397 | 10.0794 | 20.1587 | 40.3175 | 80.6349 | 161.2699 | 322.54 | 645.08 | 1290.159 | 2580.318 4 | 5.6569 | 11.3137 | 22.6274 | 45.2548 | 90.5097 | 181.0193 | 362.039 | 724.077 | 1448.154 | 2896.309 5 | 6.3496 | 12.6992 | 25.3984 | 50.7968 | 101.5937 | 203.1873 | 406.375 | 812.749 | 1625.498 | 3250.997 6 | 7.1272 | 14.2544 | 28.5088 | 57.0175 | 114.035 | 228.0701 | 456.14 | 912.28 | 1824.561 | 3649.122 Table 4. USAF 1951 individual linewidth, μm. Element number versus group number: 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 1 | 125 | 62.5 | 31.25 | 15.63 | 7.81 | 3.91 | 1.953 | 0.977 | 0.488 | 0.244 2 | 111.36 | 55.68 | 27.84 | 13.92 | 6.96 | 3.48 | 1.743 | 0.872 | 0.436 | 0.218 3 | 99.21 | 49.61 | 24.8 | 12.4 | 6.2 | 3.1 | 1.55 | 0.775 | 0.387 | 0.194 4 | 88.39 | 44.19 | 22.1 | 11.05 | 5.52 | 2.76 | 1.381 | 0.69 | 0.345 | 0.173 5 | 78.75 | 39.37 | 19.69 | 9.84 | 4.92 | 2.46 | 1.23 | 0.615 | 0.308 | 0.154 6 | 70.15 | 35.08 | 17.54 | 8.77 | 4.38 | 2.19 | 1.099 | 0.55 | 0.275 | 0.137

Specifications

ParameterValue
MaterialUV Fused Silica
Dimensions25 mm × 25 mm
Dimensional Tolerance±0.2 mm
Thickness1 mm
Thickness Tolerance±0.1 mm
Surface quality (scratch/dig)40/20
Height255 nm
TypePositive + Negative
Resolution RangeUSAF1951 2/1-11/3
General Parameters - Optic MaterialUV Fused Silica

Key Features

Quantitative Phase Imaging Tests; Customizable Ranges and Heights; AFM Inspection Report Provided

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Supplier Information

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Jcoptix
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Nanjing Jingcui Optical Technology Co., Ltd. (formerly Suzhou Jingcui Optical Technology Co., Ltd., abbreviated as JCOPTIX) is a national high-tech enterprise and a national-level specialized and sophisticated 'little giant' enterprise, established on the foundation of the Liquid Crystal and Photonics Research Center of Nanjing University. It engages in R&D, manufacturing, and sales of advanced optical technologies and products. JCOPTIX is dedicated to building a product platform for China's optical community, offering liquid crystal photonics components, precision optical components, optomechanics, fiber optic assemblies, motion control devices, and system solutions. All listed products can be found and ordered online at www.JCOPTIX.com.

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