Quantitative Phase Resolution Target OTRQP25-220
JCOPTIX quantitative-phase resolution targets use UV fused silica and precision etching for quantitative-phase imaging tests. The same artifact compares different systems/techniques and their stability. AFM structure-height/depth results at requested positions are available. Custom ranges/heights/depths are supported; contact technical support. Quantitative-phase resolution targets. Models: OTRQP25-55, OTRQP25-110, OTRQP25-165, OTRQP25-220, OTRQP25-255, OTRQP25-M50280. Size 25 mm × 25 mm; positive/negative patterns; resolution USAF1951 2/1-11/3; single/multiple heights. JCOPTIX targets measure 25 mm × 25 mm, thickness 1 mm, and can contain both positive/negative patterns over USAF1951 2/1-11/3. Single heights are 55 nm, 110 nm, 165 nm, 220 nm, 255 nm; multiple heights are 50 nm, 100 nm, 150 nm, 200 nm, 250 nm, 280 nm. Contact support for customization. Technical notes: measured examples/reference tables, not measurements promised for every model/item. Targets measure 25 mm × 25 mm, thickness 1 mm, with both pattern polarities and USAF1951 2/1-11/3 resolution; Figures 1 and 2 show patterns. Custom ranges/heights/depths are available. Figure 1. Pattern layout. Figure 2. Optical-microscope photograph. The same artifact compares quantitative-phase systems/techniques and stability. Tables 1 and 2 show selected measured heights; AFM results at specified positions can be provided. Table 1. AFM measurements of single-height targets. Height in nm/position: 2um LS, USAF 4-1, USAF 6-1, USAF 8-1, USAF 10-1, USAF 11-3. Columns are target, six AFM readings, min, max, average. 110 | 116.935| 118.389 | 120.838 | 118.699 | 114.466 | 119.366 | 114.466 | 120.838 | 118.116 220 | 222.485 | 213.716 | 218.213 | 217.517 | 220.504 | 223.184 | 213.716 | 223.184 | 219.27 Table 2. Measured multilevel steps. Columns: target height nm, position, profilometer height nm, average nm. 50 | center| 49.45 | 53.12 50 | top | 54.94 | 53.12 50 | bottom | 54.97 | 53.12 100 | center | 97.72 | 95.86 100 | top | 96.13 | 95.86 100 | bottom | 93.74 | 95.86 150 | center | 153.41 | 155.69 150 | top | 155.55 | 155.69 150 | bottom | 158.11 | 155.69 200 | center | 201.36 | 204.69 200 | top | 203.02 | 204.69 200 | bottom | 209.7 | 204.69 250 | center | 248.5 | 245.22 250 | top | 248.64 | 245.22 250 | bottom | 238.53 | 245.22 280 | center | 279.87 | 284.47 280 | top | 278.64 | 284.47 280 | bottom | 294.89 | 284.47 Table 3 lists USAF 1951 group/element resolutions, calculated by Resolution=2^(Group+(Element-1)/6). Table 4 lists USAF 1951 individual linewidths, calculated by Width=1/(2×Resolution). These USAF 1951 targets use standard formulas or Tables 3 and 4 for linewidth/resolution. Figure 3 shows electron-microscope measurements with linewidth error below 15%. Figure 3. SEM measurement results. Table 3. USAF 1951 line-pair resolution, lp/mm. Element number versus group number: 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 1 | 4 | 8 | 16 | 32 | 64 | 128 | 256 | 512 | 1024 | 2048 2 | 4.4898 | 8.9797 | 17.9594 | 35.9188 | 71.8376 | 143.6751 | 286.85 | 573.7 | 1147.401 | 2294.802 3 | 5.0397 | 10.0794 | 20.1587 | 40.3175 | 80.6349 | 161.2699 | 322.54 | 645.08 | 1290.159 | 2580.318 4 | 5.6569 | 11.3137 | 22.6274 | 45.2548 | 90.5097 | 181.0193 | 362.039 | 724.077 | 1448.154 | 2896.309 5 | 6.3496 | 12.6992 | 25.3984 | 50.7968 | 101.5937 | 203.1873 | 406.375 | 812.749 | 1625.498 | 3250.997 6 | 7.1272 | 14.2544 | 28.5088 | 57.0175 | 114.035 | 228.0701 | 456.14 | 912.28 | 1824.561 | 3649.122 Table 4. USAF 1951 individual linewidth, μm. Element number versus group number: 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 1 | 125 | 62.5 | 31.25 | 15.63 | 7.81 | 3.91 | 1.953 | 0.977 | 0.488 | 0.244 2 | 111.36 | 55.68 | 27.84 | 13.92 | 6.96 | 3.48 | 1.743 | 0.872 | 0.436 | 0.218 3 | 99.21 | 49.61 | 24.8 | 12.4 | 6.2 | 3.1 | 1.55 | 0.775 | 0.387 | 0.194 4 | 88.39 | 44.19 | 22.1 | 11.05 | 5.52 | 2.76 | 1.381 | 0.69 | 0.345 | 0.173 5 | 78.75 | 39.37 | 19.69 | 9.84 | 4.92 | 2.46 | 1.23 | 0.615 | 0.308 | 0.154 6 | 70.15 | 35.08 | 17.54 | 8.77 | 4.38 | 2.19 | 1.099 | 0.55 | 0.275 | 0.137
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Overview
Specifications
| Parameter | Value |
|---|---|
| Material | UV Fused Silica |
| Dimensions | 25 mm × 25 mm |
| Dimensional Tolerance | ±0.2 mm |
| Thickness | 1 mm |
| Thickness Tolerance | ±0.1 mm |
| Surface quality (scratch/dig) | 40/20 |
| Height | 220 nm |
| Type | Positive + Negative |
| Resolution Range | USAF1951 2/1-11/3 |
| General Parameters - Optic Material | UV Fused Silica |
Key Features
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