Atomic Force Microscope - Tosca Tosca 200
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Specifications
| Parameter | Value |
|---|---|
| Scanner - X-Y Scan Range | 50 µm x 50 µm* |
| Scanner - Z Scan Range | 10 µm** |
| Maximum Scan Speed | 5lines/s |
| Maximum Sample Diameter | 45 mm |
| Maximum Sample Height | 25 mm |
| Maximum Sample Weight | <600 g |
| Automated Platform - X-Y Stage | 100 mm Travel |
| Automated Platform - Z Stage | 85 mm Travel |
| Automated Platform - Positioning Repeatability [Unidirectional] | <1 µm |
| Video Microscope - Camera | Color, 5 million Pixels, CMOS Sensor |
| Video Microscope - Field of View | 1.73 mm x 1.73 mm |
| Video Microscope - Spatial Resolution | 5 µm |
| Video Microscope - Focusing | Autofocus |
| Overview Camera - Camera | Color, 5 million Pixels, CMOS Sensor |
| Overview Camera - Field of View | 40 mm x 40 mm |
| Overview Camera - Spatial Resolution | 50 µm |
| Side-View Camera | Monochrome, Field-of-View Diameter Approximately 30 mm |
| Standard Mode | Contact Mode, Tapping Mode (Including Phase Imaging), Lateral Force Microscopy, Force-Distance Curves |
| Optional Mode | Contact Resonance Amplitude Imaging |
| AFM Unit Dimensions (Length×Width×Height) | 490 mm x 410 mm x 505 mm |
| Controller Dimensions (Length×Width×Height) | 340 mm x 305 mm x 280 mm |
| AFM Unit Weight | 51.1 kg |
| Controller Weight | 7.8 kg |
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Supplier Information
Beijing Naz Precision Technology Co., Ltd. was established in 2018, located in Haidian District, Beijing. The company is dedicated to precision positioning equipment, providing piezoelectric ceramic nano positioning stages, large stroke nano positioning stages, air bearing rotary tables, multi-axis stages, laser interferometers, etc., widely applied in metrology, microscopy, life sciences, laser technology, and semiconductor fields. It is the authorized dealer of German Smaract in China, and independently develops linear motors and air bearing stages. Its AFM ultra-thin ultra-stable linear stage is unique in China, and high-precision air bearing platforms provide domestic high-performance displacement stages for semiconductor inspection.
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