Laser diode device material epitaxial wafers: InAlAs, InGaAs and AlGaAs
In Laser Diode, LASER is an acronym for "Light Amplification by Stimulated Emission of Radiation". A laser diode is also called a semiconductor laser and is commonly abbreviated LD. Light generated by injected current is amplified by repeated travel between 2 mirrors until laser oscillation occurs. Simply put, a laser diode can also be described as a light-emitting LED whose light is amplified by mirrors. The development prospects of LDs are promising.
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Overview
In Laser Diode, LASER is an acronym for "Light Amplification by Stimulated Emission of Radiation". A laser diode is also called a semiconductor laser and is commonly abbreviated LD. Light generated by injected current is amplified by repeated travel between 2 mirrors until laser oscillation occurs. Simply put, a laser diode can also be described as a light-emitting LED whose light is amplified by mirrors. The development prospects of LDs are promising.
Applications
Suitable as a light source for long-distance, high-capacity communications and for accessing high-density recording media; Widely used in optical communications and optical storage. Infrared wavelengths of epitaxial wafers our company can produce: 808nm: GaAlAs pumping in DPSS Nd:YAG lasers, for example in green laser pointers or as arrays in high-power lasers. 848nm: Laser mice. 980nm: InGaAs pumping for optical amplifiers and for Yb:YAG DPSS lasers. 1064 nm: AlGaAs fiber-optic communications and DPSS laser pumping frequency.
Key Features
An LD produces light with identical wavelength and phase properties, so high coherence is its defining characteristic; Laser diodes (Laser Diode, LD) are lightweight, thin, short and small, with long service life, vibration resistance, good directionality and high output power.
Datasheet
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Supplier Information
Zhongke Xindian Semiconductor Technology (Beijing) Co., Ltd. was established in October 2014. It is a high-tech enterprise specializing in the R&D and production of InP-based and GaAs-based optoelectronic and microelectronic MBE epitaxial materials. The company has passed ISO9001:2015, ISO14001, Beijing High-tech Enterprise, Zhongguancun High-tech Enterprise and other related certifications.
The company currently has multiple production lines of Veeco GEN2000 mass-production MBE epitaxial wafer processes from the United States, as well as a full set of internationally advanced analytical and testing equipment. It has built more than 2,000 square meters of supporting factory buildings, including Class 10, Class 100 and Class 1000 cleanrooms. In 2022, large-scale production was achieved, with a capacity of 80,000 wafers per year (converted to 2 inches).
InP-based and GaAs epitaxial materials are core components of chips and devices such as optical communications, photodetectors, microwave RF, and laser sensors. The company's products cover important applications in the optoelectronic field such as APD, PD, VCSEL, QCL, and in the microelectronic field such as PHEMT, HEMT, HBT, SBD, RTD. Some products (such as 10G, 25G, 50G APD, 800G, 1.6T PD, PHEMT, etc.) have reached the performance level of similar international products and achieved multi-batch mass production.
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