Silicon Aspheric Lens PAsSi-
Silicon aspherical lenses have advantages such as high transmittance, high precision, and high stability, and can be used to manufacture high-precision optical systems and instruments, such as infrared imaging systems, infrared spectrometer systems, etc. Due to its high refractive index and dispersion properties, silicon can also be used to manufacture lenses and lenses with special optical effects. It can be coated with MgF2, UV-AR, UV-VIS, VIS-EXT, VIS-NIR, NIR I, NIR II, Telecom NIR, SWIR, SWIR, YAG-BBAR and other film systems.
Specification Snapshot
Dia
2-300 mm
Focal Length
15-5000 mm
Center Thickness
0.12-60 mm
Edge Thickness
0.12-60 mm
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Overview
Silicon aspherical lenses have advantages such as high transmittance, high precision, and high stability, and can be used to manufacture high-precision optical systems and instruments, such as infrared imaging systems, infrared spectrometer systems, etc. Due to its high refractive index and dispersion properties, silicon can also be used to manufacture lenses and lenses with special optical effects. It can be coated with MgF2, UV-AR, UV-VIS, VIS-EXT, VIS-NIR, NIR I, NIR II, Telecom NIR, SWIR, SWIR, YAG-BBAR and other film systems.
Specifications
| Parameter | Value |
|---|---|
| Dia | 2-300 mm |
| Focal Length | 15-5000 mm |
| Center Thickness | 0.12-60 mm |
| Edge Thickness | 0.12-60 mm |
| Design Wavelength | Custom |
| Radius of Curvature | Custom |
| Surface Quality | 60-40 |
| Diameter Tolerance | +0.0/-0.1 |
| Thk Tolerance | ±0.1 mm |
| Substrate Material | Silicon(Si) |
| PV [@632.8nm] | λ/4 |
| Centering | <3′ |
| Clear Aperture | >90% |
| Coating | Uncoated |
| REACH | Compliant |
| ROHS | Compliant |
| Transmission Range [Substrate Material:Silicon(Si)] | 1.2-15μm |
| Refractive Index [Substrate Material:Silicon(Si);@10μm] | 3.41776%@10μm |
| Reflection Loss [Substrate Material:Silicon(Si);@10μm] | 46.1%@10μm |
| Structure [Substrate Material:Silicon(Si)] | Single crystal,synthetic |
| Cleavage Planes [Substrate Material:Silicon(Si)] | <111> |
| Density [Substrate Material:Silicon(Si)] | 2.33 g/cm³ |
| Melting Point [Substrate Material:Silicon(Si)] | 1414 ℃ |
| Thermal Conductivity [Substrate Material:Silicon(Si);@313K] | 163 @ 313K |
| Thermal Expansion [Substrate Material:Silicon(Si);@293K] | 2.6 @ 293K |
| Knoop Hardness [Substrate Material:Silicon(Si)] | 1100 kg/mm² |
| Specific Heat Capacity [Substrate Material:Silicon(Si)] | 712.8 J/(kg×K) |
| Dielectric Constant [Substrate Material:Silicon(Si);@f= 9.37GHz] | 13 @f= 9.37GHz |
| Young's Modulus (E) [Substrate Material:Silicon(Si)] | 130.91 GPa |
| Shear Modulus(G) [Substrate Material:Silicon(Si)] | 79.92 GPa |
| Bulk Modulus(K) [Substrate Material:Silicon(Si)] | 101.97 GPa |
| Poisson Coefficient [Substrate Material:Silicon(Si)] | 0.266 |
| Solubility [Substrate Material:Silicon(Si)] | None |
| Molecular Weight [Substrate Material:Silicon(Si)] | 28.09 g/mol |
Applications
OPTICS Laser Imaging
Datasheet
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Supplier Information
UM OPTICS is located at No. 100 Light Industry Park, Chengguan Town, Shangcheng County, Xinyang City, Henan Province, China. It is a high-tech enterprise integrating material growth, component processing, coating and devices, with over 400 employees and a team of optical design, production R&D and technical experts, including 19 doctoral degree holders and over 15% scientific researchers. Its business covers all infrared materials including fluoride, Si, Ge, ZnS and ZnSe, forming a closed loop of the entire industry chain from crystal raw material preparation, crystal growth, initial processing of components, precision processing, coating to components. It has machining centers for flat, spherical and aspherical surfaces with an annual output of over 5 million optical lenses, and an annual production capacity of over 80 tons of fluoride and over 26 tons of silicon and germanium materials, providing customized low-stress, high-purity and high-uniformity infrared crystals to customers in over 60 countries and regions.
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