SUPERSCAN IV Series High-Dynamic Galvanometer Scanners SS IV-30

SUPERSCAN IV Series High-Dynamic Galvanometer Scanners SS IV-30

Supplier
Sinteclaser
Part Number
SS IV-30
Category
Encoders
Origin
China

SUPERSCAN IV is a high-dynamic, high-speed digital galvanometer scanner using model-based digital regulation and PWM power output to reduce heat. It supports XY2‑100‑E Enhanced and SL2‑100 protocols. The main structure is water-cooled, and IV‑30 supports mirror purging. SOLAR is dedicated to photovoltaics/wafers and requires 48V power. Dynamic response is optimized for MOTF on-the-fly processing, with high configurations supporting laser power up to 6 kW. Model positioning and mirror coating/material and tuning configurations (not technical parameters): Model | SS IV-10 | SS IV-15 | SS IV SOLAR | SS IV-20 | SS IV-30 Product Positioning | High-end industrial applications | High-end industrial applications | High-end industrial applications ( Wafer / Photovoltaics ) | High-end industrial applications | High-end industrial applications 343 nm | — | — | SC(15 and 20 available for both ) | — | — 355 nm( Ultraviolet ) | Si | QU | QU,SC (15) / SC (20) | QU | — 420–480 nm | — | — | — | — | QU 515 nm | — | — | SC( only 15) | — | — 532 nm( Green light ) | Si | QU,Si | QU,SC (15) / — (20) | QU,SC | — 900–1100 nm + AL | — | — | — | — | QU,SC 1020–1040 nm (>3 kW High power ) | — | — | — | — | QU 1030 / 1070 nm | — | SC | SC( only 15) | — | — 1064 nm( Fiber ) | Si | QU,Si,SC | QU,SC (15) / SC (20) | QU,SC | SI,SC,QU 1060–1080 nm | — | QU( High-power coating ) | QU( only 15) | — | QU(>3 kW High power ) 10.6 μm(CO₂) | — | Si,SC | — | Si,SC | Si,SC Optional Tuning | VC( Vector ) M( Micromachining ) | VC、C( Cleaning ) H( Hatching ) | PL( High linearity ) W( Wafer ) | VC( Other options available ) | VC( Fast vector ) FV( High-dynamic fast vector )

Specification Snapshot
Operating Temperature
+15~+35 ℃
Storage Temperature
−10~+60 ℃
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Overview

SUPERSCAN IV is a high-dynamic, high-speed digital galvanometer scanner using model-based digital regulation and PWM power output to reduce heat. It supports XY2‑100‑E Enhanced and SL2‑100 protocols. The main structure is water-cooled, and IV‑30 supports mirror purging. SOLAR is dedicated to photovoltaics/wafers and requires 48V power. Dynamic response is optimized for MOTF on-the-fly processing, with high configurations supporting laser power up to 6 kW. Model positioning and mirror coating/material and tuning configurations (not technical parameters): Model | SS IV-10 | SS IV-15 | SS IV SOLAR | SS IV-20 | SS IV-30 Product Positioning | High-end industrial applications | High-end industrial applications | High-end industrial applications ( Wafer / Photovoltaics ) | High-end industrial applications | High-end industrial applications 343 nm | — | — | SC(15 and 20 available for both ) | — | — 355 nm( Ultraviolet ) | Si | QU | QU,SC (15) / SC (20) | QU | — 420–480 nm | — | — | — | — | QU 515 nm | — | — | SC( only 15) | — | — 532 nm( Green light ) | Si | QU,Si | QU,SC (15) / — (20) | QU,SC | — 900–1100 nm + AL | — | — | — | — | QU,SC 1020–1040 nm (>3 kW High power ) | — | — | — | — | QU 1030 / 1070 nm | — | SC | SC( only 15) | — | — 1064 nm( Fiber ) | Si | QU,Si,SC | QU,SC (15) / SC (20) | QU,SC | SI,SC,QU 1060–1080 nm | — | QU( High-power coating ) | QU( only 15) | — | QU(>3 kW High power ) 10.6 μm(CO₂) | — | Si,SC | — | Si,SC | Si,SC Optional Tuning | VC( Vector ) M( Micromachining ) | VC、C( Cleaning ) H( Hatching ) | PL( High linearity ) W( Wafer ) | VC( Other options available ) | VC( Fast vector ) FV( High-dynamic fast vector )

Specifications

ParameterValue
Supply Voltage30 V or 48 V
Current2 A RMS, maximum 5 A
Ripple / Noise [20 MHz]≤200 mVpp @20 MHz
InterfaceDigital XY2-100-E Enhanced + SL2-100
Operating Temperature+15~+35 ℃
Storage Temperature−10~+60 ℃
Humidity [Noncondensing]≤80%
ProtectionIP64
Typical Deflection Angle±0.393 rad
Resolution [XY2-100-E;16 bit]12 μrad
Resolution [SL2-100;20 bit]0.76 μrad
Repeatability [RMS]<2.0 μrad
Position Noise [RMS]<3.2 μrad
Temperature Drift — Gain15 ppm/K
Temperature Drift — Position10 μrad/K
h Long-Term Drift (without Water Cooling) [8 h; without water cooling]<60 μrad
h Long-Term Drift (with Water Cooling) [8 h; with water cooling]<40 μrad
Input Aperture30 mm
Beam Displacement36.0 (SI/SC) / 35.4 (QU)
Weight (Without Lens) [Without a lens]≈5.5 (stainless steel housing ≈12.0)
External Form L×W×H203 mm × 159 mm × 150 mm
Processing / Positioning Speed [@30 V / @48 V]QU - Vector :30/50 SI - Vector :35/55 SC - Vector :40/65 SC-FV:30/50
Tracking ErrorQU - Vector :0.48 SI - Vector :0.43 SC - Vector :0.30 SC-FV:0.24
1% Step ResponseQU - Vector :1.2 SI - Vector :1.0 SC - Vector :0.8 SC-FV:0.65
Examples of Linear Speed across the Working Field10.6 m/s(SC,65 rad/s) 12.7 m/s(QU,f=254 mm,50 rad/s)
Water Cooling✓ (straight-through [W] or 90° [W2])
Air purge (mirror)✓( Only IV-30,50–100 L/min,1.0–1.5 bar)

Applications

MOTF on-the-fly marking and dynamic processing Scribing, perforating, and cutting plastic films and paper in the packaging industry High-speed marking of electronic components Photovoltaic silicon wafer scribing Remote laser welding Industrial laser processing requiring high-speed scanning and high dynamic response

Key Features

Model-based digital adjustment and PWM power output reduce power consumption and overall heating. Supports both XY2‑100‑E enhanced (16bit) and SL2‑100 (20bit) protocols. Excellent dynamic response optimized specifically for MOTF on-the-fly processing. Water-cooled main structure; optional mirror air purge for SS‑IV‑30. VC / M / C / H / FV / W / PL tuning options cover vector processing, cleaning, filling, wafer and photovoltaic processing. The SOLAR photovoltaic version is optimized for silicon wafer scribing and supports only + 48 V power. A wide range of mirror substrates and coatings accommodates ultraviolet, green, fiber, and CO₂ laser wavelengths.

Datasheet

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Supplier Information

Si
Sinteclaser
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Wuhan Sintec Optoelectronics Technology Co., Ltd. is a high-tech enterprise and a specialized and sophisticated 'Little Giant' enterprise at the upstream of the domestic laser industry chain. The company focuses on the R&D, manufacturing, sales and service of lasers and laser accessories. Its main products include femtosecond lasers, picosecond lasers, acousto-optic modulators, optical components, etc., widely used in laser equipment manufacturing, scientific research and other fields. Located in Wuhan Optical Valley, with a modern industrial park, the company provides one-stop personalized services for the laser industry, with customers all over China and products exported overseas.

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