Reflectometric Film Thickness Measurement Instruments MetronFilm
The MetronFilm reflectometric film thickness gauge is a professional instrument for precise and rapid thin-film thickness inspection using noncontact optical technology. Its independently developed high-resolution spectrometer and powerful intelligent algorithms enable nondestructive measurement of thickness and optical constants of transparent or translucent films.
Specification Snapshot
Wavelength Range
380~1100nm
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Overview
The MetronFilm reflectometric film thickness gauge is a professional instrument for precise and rapid thin-film thickness inspection using noncontact optical technology. Its independently developed high-resolution spectrometer and powerful intelligent algorithms enable nondestructive measurement of thickness and optical constants of transparent or translucent films.
Specifications
| Parameter | Value |
|---|---|
| Wavelength Range | 380~1100nm |
| Light Source | Built-in halogen lamp |
| Thickness Measurement Range [Material-dependent] | 15nm ~ 260μm |
| Minimum Thickness for n&k Measurement [Material-dependent] | 50nm |
| Accuracy [Material-dependent] | 2nm @ ≤1000nm, or 0.2% @ ≥1000nm |
| Accuracy [Over 10 consecutive days, an 800nm-thick SiO₂-on-Si film is measured 100 times daily; this value is the mean of the standard deviation values of these daily averages (1σ)] | 0.02nm |
| Stability [Over 10 consecutive days, an 800nm-thick SiO₂-on-Si film is measured 100 times daily; this value is 2 times the standard deviation of these daily averages (2σ)] | 0.05nm |
| Spot Size | 1.5mm |
| Sample Size | Diameter from 1mm to 300mm or larger |
| Measurement Speed | Less than 1s for a single layer |
Applications
Semiconductor processes: 3D NAND extends beyond 2D scaling limits through vertically stacked alternating layers, exceeding 200 layers, requiring nondestructive optical measurement of each layer's thickness and uniformity. Optical coatings: AR (antireflection) + HC (hard-coating) bilayers in eyeglass and camera lenses require accurate nondestructive thickness and n&k measurements for process and yield improvement. Thin-film optoelectronics: SiNₓ front AR layers and Al₂O₃/SiNₓ rear passivation in photovoltaic PERC cells require precise thickness and n&k measurement and control for efficiency and production stability.
Key Features
Ultrawide 1nm~260μm measurement range. Its broad coverage of 1nm~260μm accurately measures ultrathin through thick films. Repeatability <0.02nm: an independently developed high-resolution spectrometer provides repeatability down to 0.02nm for demanding semiconductor and optoelectronic measurements. NIST traceability: accuracy 1nm @ below 500nm, or 0.2 % @ above 500nm*. Advanced processes: measured binary-composite multilayer films up to 232 layers, including 3D NAND, AR+HC optical coatings, and PERC films. Optical-constant fitting: rapid layer-by-layer detection of n (refractive index) and k (extinction coefficient); single-layer thickness and optical constants fit within 1s.
Datasheet
Product Datasheet
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Supplier Information
Shanghai Ideaoptics Co., Ltd. is a national-level specialized and sophisticated 'Little Giant' enterprise, a deep-spectrum technology innovator. Devoted to the micro-nano optoelectronic field, it develops intelligent full-spectrum technology integrating photonics and AI, building an internationally leading deep-spectrum platform. The company provides comprehensive solutions from technology to products, including micro spectrometers, angle-resolved spectrometers, and confocal Raman spectrometers, widely applied in IC chips, optical chips, biochips, AR/VR, and advanced displays. Through joint R&D centers with universities, Ideaoptics continuously launches breakthrough products, serving over 3,000 customers and cooperating with 170+ semiconductor, advanced materials, and biomedical enterprises, aiming to advance photonic integration and empower semiconductor manufacturing.
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