Suhui MST XL350 and Suhui MST FHDXL350 Digital Phase-Shifting Laser Interferometers
Under stringent requirements, components must be measured in their operating orientation, as with many windows, mirrors, and semiconductor wafers. XL350 has a clear aperture of 350mm. Its objective is mounted above, with the optical path directed downward, making it suitable for measuring samples placed flat.
Specification Snapshot
Dimensions [Length, width, and height]
1500 mm × 1500 mm × 2600 mm
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Overview
Under stringent requirements, components must be measured in their operating orientation, as with many windows, mirrors, and semiconductor wafers. XL350 has a clear aperture of 350mm. Its objective is mounted above, with the optical path directed downward, making it suitable for measuring samples placed flat.
Specifications
| Parameter | Value |
|---|---|
| Measurement Method | Fizeau Interferometry Principle |
| Effective Clear Aperture | 350mm |
| Light Source | Wavelength-tunable laser, center wavelength 632.8nm |
| Camera | Effective sensor size 18.43x18.43mm, effective imaging resolution 4Kx4K |
| Lateral Resolution ITF [@2.43lp/mm; phase-shifting mode] | ITF>0.7@2.43lp/mm (phase-shifting mode) |
| Measurement Mode | Sirius vibration-resistant wavelength phase shifting FT-FPSI and multiple-surface separation technology MST |
| RMS Repeatability [2σ] | λ/5000 |
| RMS Wavefront Repeatability [mean+2σ] | <0.6nm |
| Continuous Zoom Ratio [Fixed Magnification] | 1-fold fixed magnification |
| Alignment Method [Alignment Angle ±1°] | Fast digital alignment system DAS, alignment angle ±1° |
| Pupil Focus Adjustment Range | ±2m |
| Transmission Reference Material | Imported fused silica with homogeneity better than 4ppm and stress better than 4nm/cm |
| Transmission Reference Flat PVr | PVr: better than λ/10 |
| Power Supply | 100-240VAC,50/60Hz |
| Dimensions [Length, width, and height] | 1500 mm × 1500 mm × 2600 mm |
| Weight | 1000Kg |
Key Features
Integrated vibration-resistant design: the isolation system and instrument structure are integrated for stable measurement and compact construction. The stage incorporates a vacuum generator, facilitating pneumatic connection for vacuum holding of measurement suction cups and wafers. Data segmentation and analysis module: a segmentation mask divides data into specified rows and columns and calculates valid pixels, PV, RMS, LTV and mean phase for each subregion, plus statistics across all regions. Supports overlapping or spaced subregion segmentation analysis. Large measurement range: a new optical design improves the system transfer function and provides a large flatness measurement range for online measurement and control of flatness and warpage in semiconductors and other fields. Optimized vertical structure: design accounts for gravity-induced deformation (Power) when the reference flat lies horizontally, with manufacturing compensation to ensure overall instrument accuracy. Sirius FPSI vibration-resistant phase shifting removes vibration-induced ripple modulation for stable, reliable measurements.
Datasheet
Product Datasheet
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Supplier Information
Founded in June 2009, Shanghai Qianyao Optical Technology Co., Ltd. is located in Jiading District, Shanghai, and is a high-tech enterprise. The company specializes in the development and sales of optical testing instruments, primarily mid-to-high-end laser interferometers and custom products, serving metrology, scientific research, optical cold processing, and mobile phone panel inspection fields. Its customers include universities, research institutes, Huawei, Sony, and Hikvision. The company masters core laser interferometer technologies, achieving in-house production of optical components, and possesses capabilities in classical optical cold processing, high-efficiency optical cold processing, optical polishing, and ion beam processing. With an annual production capacity of 700 interferometers and cumulative sales exceeding 2000 units, its products are sold domestically and exported to Japan, Korea, the USA, and Europe.
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