"Suhui" UV Ultraviolet Laser Interferometer 素绘355-60
In patterned-wafer defect inspection and unpatterned-wafer surface defect inspection equipment, the objective is the most technically demanding core component. It is used for lithographic alignment and inspection to ensure accurate pattern replication. Objectives feature high numerical aperture NA, short-wavelength light sources, high transmittance, low distortion, and multispectral imaging. A higher numerical aperture (NA) provides higher resolution to detect smaller defects and collect more scattered light, improving detection sensitivity. Short-wavelength light sources, such as deep ultraviolet at 266nm or even shorter at 193nm, further improve resolution and precision. Combining sources of different wavelengths enables multispectral imaging to identify different defect types. Ultraviolet laser interferometers use ultraviolet lasers as light sources to comprehensively assess objective wavefront aberrations. Compared with Hartmann sensors, they offer higher resolution and measurement accuracy, providing a new solution for wavefront-aberration measurement of objectives used in wafer defect inspection. Qianyao Optics provides laser interferometers at wavelengths including 193, 266, 355/360, 457, and 532nm, together with accessories such as ultrahigh-precision transmission flat and spherical reference optics (PVr<12.65nm), NA0.95 highly reflective spherical mirrors, and adjustment mounts to support laser interferometer applications at different wavelengths.
Overview
Specifications
| Parameter | Value |
|---|---|
| Effective Clear Aperture | 60mm |
| Measurement Method | Fizeau Interferometry Principle |
| Light Source | Solid-state laser, 354.8±0.2nm, 25mw, coherence length >1000m |
| Camera | Sensor Format 1/2″, Effective Imaging Resolution 1.2Kx1.2K, Frame Rate 155FPS |
| Lateral Resolution [Resolved Fringes across the Full Aperture] | >200对 |
| Software Algorithms | Sirius Vibration-Resistant Mechanical Phase Shifting |
| RMS Simple Repeatability [2δ] | <0.63nm |
| RMS Wavefront Repeatability [mean+2δ] | <0.35nm |
| Variable Magnification Zoom [Fixed Magnification] | 1X Fixed Magnification |
| Alignment Method [AFAS marked optional in the key performance text; alignment angle ±3°] | Fast digital alignment system DAS, alignment angle ±3°; equipped with fully automatic fringe alignment system AFAS for automatic fringe finding and measurement |
| Pupil Focus Adjustment Range | ±1.5m |
| Optical Center Height [Optional] | 108mm and 220mm Optional |
| Power Supply | 100-240VAC,50/60Hz |
| Dimensions [Length, width, and height] | 480 mm × 286 mm × 150 mm |
| Weight | 15KG |
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