"Suhui" UV Ultraviolet Laser Interferometer 素绘HD266-100

"Suhui" UV Ultraviolet Laser Interferometer 素绘HD266-100

Supplier
Shineoptics
Part Number
素绘HD266-100
Category
Interferometers
Origin
China

In patterned-wafer defect inspection and unpatterned-wafer surface defect inspection equipment, the objective is the most technically demanding core component. It is used for lithographic alignment and inspection to ensure accurate pattern replication. Objectives feature high numerical aperture NA, short-wavelength light sources, high transmittance, low distortion, and multispectral imaging. A higher numerical aperture (NA) provides higher resolution to detect smaller defects and collect more scattered light, improving detection sensitivity. Short-wavelength light sources, such as deep ultraviolet at 266nm or even shorter at 193nm, further improve resolution and precision. Combining sources of different wavelengths enables multispectral imaging to identify different defect types. Ultraviolet laser interferometers use ultraviolet lasers as light sources to comprehensively assess objective wavefront aberrations. Compared with Hartmann sensors, they offer higher resolution and measurement accuracy, providing a new solution for wavefront-aberration measurement of objectives used in wafer defect inspection. Qianyao Optics provides laser interferometers at wavelengths including 193, 266, 355/360, 457, and 532nm, together with accessories such as ultrahigh-precision transmission flat and spherical reference optics (PVr<12.65nm), NA0.95 highly reflective spherical mirrors, and adjustment mounts to support laser interferometer applications at different wavelengths.

Specification Snapshot
Dimensions [Length, width, and height]
704 mm × 330 mm × 460 mm
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Overview

In patterned-wafer defect inspection and unpatterned-wafer surface defect inspection equipment, the objective is the most technically demanding core component. It is used for lithographic alignment and inspection to ensure accurate pattern replication. Objectives feature high numerical aperture NA, short-wavelength light sources, high transmittance, low distortion, and multispectral imaging. A higher numerical aperture (NA) provides higher resolution to detect smaller defects and collect more scattered light, improving detection sensitivity. Short-wavelength light sources, such as deep ultraviolet at 266nm or even shorter at 193nm, further improve resolution and precision. Combining sources of different wavelengths enables multispectral imaging to identify different defect types. Ultraviolet laser interferometers use ultraviolet lasers as light sources to comprehensively assess objective wavefront aberrations. Compared with Hartmann sensors, they offer higher resolution and measurement accuracy, providing a new solution for wavefront-aberration measurement of objectives used in wafer defect inspection. Qianyao Optics provides laser interferometers at wavelengths including 193, 266, 355/360, 457, and 532nm, together with accessories such as ultrahigh-precision transmission flat and spherical reference optics (PVr<12.65nm), NA0.95 highly reflective spherical mirrors, and adjustment mounts to support laser interferometer applications at different wavelengths.

Specifications

ParameterValue
Effective Clear Aperture101.6mm
Measurement MethodFizeau Interferometry Principle
Light SourceSingle-longitudinal-mode continuous-wave laser, 266±0.1nm, 20mw, coherence length >1000m
CameraUltraviolet camera sensor size 2/3″, effective imaging resolution 2Kx2K, frame rate 66FPS
Lateral Resolution [Resolved Fringes across the Full Aperture]>450对
Software AlgorithmsSirius Vibration-Resistant Mechanical Phase Shifting
RMS Simple Repeatability [2δ]<0.63nm
RMS Wavefront Repeatability [mean+2δ]<0.35nm
Variable Magnification Zoom [Fixed Magnification]1X Fixed Magnification
Alignment Method [AFAS marked optional in the key performance text; alignment angle ±3°]Fast digital alignment system DAS, alignment angle ±3°; equipped with fully automatic fringe alignment system AFAS for automatic fringe finding and measurement
Pupil Focus Adjustment Range±2.5m
Optical Center Height [Optional]108mm and 220mm Optional
Power Supply100-240VAC,50/60Hz
Dimensions [Length, width, and height]704 mm × 330 mm × 460 mm
Weight50KG

Applications

Wavefront aberration measurement of objectives for wafer defect inspection

Key Features

Narrow-linewidth, single-longitudinal-mode UV lasers: linewidths of 50kHz (266nm) and 1MHz (355nm), respectively. The complete instrument has optical contamination protection for stable, reliable operation in a Class 100 cleanroom; optical system replacement after contamination is available. The fast digital alignment system DAS helps operators rapidly capture the spot when locating images in UV optical testing. An optional fully automatic fringe alignment system AFAS enables automatic null-field finding and measurement. Extensive reference optics ensure high-accuracy measurement: ultrahigh-precision transmission flats and reference spheres (PVr≤12.65nm), and NA0.95 high-reflectance spherical mirrors.

Datasheet

Product Datasheet
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Supplier Information

Sh
Shineoptics
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Founded in June 2009, Shanghai Qianyao Optical Technology Co., Ltd. is located in Jiading District, Shanghai, and is a high-tech enterprise. The company specializes in the development and sales of optical testing instruments, primarily mid-to-high-end laser interferometers and custom products, serving metrology, scientific research, optical cold processing, and mobile phone panel inspection fields. Its customers include universities, research institutes, Huawei, Sony, and Hikvision. The company masters core laser interferometer technologies, achieving in-house production of optical components, and possesses capabilities in classical optical cold processing, high-efficiency optical cold processing, optical polishing, and ion beam processing. With an annual production capacity of 700 interferometers and cumulative sales exceeding 2000 units, its products are sold domestically and exported to Japan, Korea, the USA, and Europe.

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"Suhui" UV Ultraviolet Laser Interferometer 素绘HD266-100
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