Knight+ Series Picosecond deep-UV 193 nm Laser
The Knight+ series industrial picosecond 193 nm laser uses a compact integrated design and a proprietary control system for improved power stability and consistent optical performance. A proprietary picosecond fiber seed source, free-space solid-state amplifier and efficient frequency conversion produce high-quality picosecond deep-ultraviolet pulses. The Knight+ picosecond 193 nm deep-ultraviolet laser provides up to 0.5W for mask-defect inspection in advanced manufacturing processes.
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Overview
The Knight+ series industrial picosecond 193 nm laser uses a compact integrated design and a proprietary control system for improved power stability and consistent optical performance. A proprietary picosecond fiber seed source, free-space solid-state amplifier and efficient frequency conversion produce high-quality picosecond deep-ultraviolet pulses. The Knight+ picosecond 193 nm deep-ultraviolet laser provides up to 0.5W for mask-defect inspection in advanced manufacturing processes.
Applications
Photomask defect inspection; Laser direct-write lithography; Precision measurement; Spectroscopy
Key Features
Integrated design; independently developed high-frequency seed source; proprietary hardware and software control system; constant power output with multistage compensation; adaptive pointing-stabilization system; real-time monitoring and recording of multiphysics data; remote diagnostics and predictive maintenance; good stability and consistency
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Supplier Information
Founded in 2021 by Dr. Bao Qiaoliang, a globally highly cited scientist, Klight Laser has grown into a national high-tech enterprise. The company focuses on the R&D and production of ultrafast ultraviolet and deep ultraviolet lasers (wavelengths: 355nm/266nm/213nm/193nm), providing deep ultraviolet light sources for semiconductor wafer defect detection (particle detection, bright/dark field detection) or mask inspection equipment. Klight's high-repetition-rate picosecond deep ultraviolet lasers fully match the technical specifications of international counterparts, independently developed with multiple core patented technologies and supplemented by intelligent control systems, offering customized light source matching services for domestic wafer inspection equipment integrators. Additionally, the company provides customized flexible micro-machining solutions in the form of laser modules, and has expanded into multiple application fields such as new energy, pan-semiconductor, and medical aesthetics.
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