BBO Electro-Optic Crystal BBO Crystal Specifications

BBO Electro-Optic Crystal BBO Crystal Specifications

Supplier
Iloptik
Part Number
BBO晶体规格指标
Category
Electro-Optics
Origin
China

BBO, β-barium borate crystal (β-Barium Borate Crystal), is an important nonlinear optical crystal widely used in laser technology and one of the most established nonlinear optical crystals for the ultraviolet band.

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Overview

BBO, β-barium borate crystal (β-Barium Borate Crystal), is an important nonlinear optical crystal widely used in laser technology and one of the most established nonlinear optical crystals for the ultraviolet band.

Specifications

ParameterValue
BBO Crystal Specifications - Dimensional Tolerance(W±0.1mm)×(H±0.1mm)×(L+0.5/-0.1mm), Reception Custom
BBO Crystal Specifications - Effective Clear Aperture95% Central Region
BBO Crystal Specifications - Surface Quality10/5(MIL-PRF-13830B Standard )
BBO Crystal Specifications - Surface Flatness [@633 nm]≤λ/8 @633 nm
BBO Crystal Specifications - Transmitted Wavefront Distortion [@633 nm]≤λ/8 @633 nm
BBO Crystal Specifications - Parallelism20″
BBO Crystal Specifications - Perpendicularity15′
BBO Crystal Specifications-Angular Tolerance≤0.25°
BBO Crystal Specifications - Chamfer≤0.2mm×45°
BBO Crystal Specifications - Edge Chipping≤0.1mm
BBO Crystal Specifications - Damage Threshold [@1064 nm, 10ns, 10 Hz (polished substrate); >0.3 GW/cm²@532 nm, 10ns, 10 Hz (antireflection coating)]>1.5 GW/cm²@1064 nm,10ns,10 Hz (Polished Substrate); >0.3 GW/cm²@532 nm,10ns,10 Hz (Antireflection Coating)
BBO Crystal Specifications - Quality Guarantee PeriodOne year (normal use)

Applications

1. Semiconductor lithography and inspection: At 7nm and smaller nodes, BBO is a core deep-UV inspection component. Frequency conversion to 266nm identifies random wafer defects below 5nm, such as copper-line shorts and microbridges, improving 3nm defect capture by 40% and reducing false alarms by 35% to improve yield. Low absorption supports lithography optical-calibration stability and breaks foreign dominance in high-end lithography BBO. For HDI PCBs and Mini/Micro LEDs, 266nm conversion enables micrometer/nanometer etching, drilling and cutting; PCB line accuracy reaches ±2μm with 50% higher efficiency than traditional processes. Large 20×20×20mm BBO supports multichannel equipment for battery-electrode UV cutting and flexible-OLED circuit repair. 1. High-power laser manufacture: BBO provides doubling, sum-frequency generation and OPO in all-solid-state lasers, converting 1064nm to 532nm and then 266nm for industrial marking/welding. A damage threshold ≥5GW/cm²@1064nm, 10ns supports stable femtosecond/picosecond output for precision medicine and research. In deep-UV spectrophotometers and Raman instruments, high transmission/low absorption improve molecular/trace-element sensitivity for VOC/heavy-metal monitoring, harmful-substance screening in food/pharmaceuticals and industrial composition analysis, improving precision by 1-2 orders of magnitude. For quantum optics, cold-atom physics and astrophysics, conversion to 266nm and shorter supports atomic cooling, quantum-state control and planetary-atmosphere analysis. BBO-generated entanglement supports quantum computing and improved qubit control. 2. Medical equipment and biosafety: In minimally invasive dental and skin-lesion systems, 266nm enables precise sterilization/ablation, improving accuracy/safety and reducing infection. Large BBO expands disinfection optical paths for biological-sample inactivation, rapid medical-waste disinfection and ICU sterilization. 1. Optical/quantum communications: Its electro-optic effect provides fast optical switches/modulators for high-bandwidth, low-latency 5G/6G. Entangled photon pairs support QKD for absolute information security in finance/government communications. Defense uses include lidar frequency conversion for high-power deep-UV detection of low-altitude/stealth targets, rapid intense UV pulses for interference with hostile optical detectors, and spacecraft UV spectrometers analyzing space atmospheres and planetary surfaces.

Key Features

Our company developed Czochralski (CZ) BBO growth, overcoming reliance on conventional molten-salt methods and significant two-photon absorption. Measurements show BBO absorption about 20 times lower than conventional BBO growth, reducing deep-UV loss, especially at 266nm; supports semiconductor lithography inspection and precision UV micromachining.

Datasheet

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Supplier Information

Il
Iloptik
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Jingzhi Optoelectronics is a high-tech enterprise focusing on the R&D and production of optoelectronic materials and core devices. Aiming to break through the "bottleneck" technologies of high-end laser crystal materials and devices, the company is committed to achieving domestic substitution of key materials in fields such as semiconductor lithography and precision micromachining. Its main products include magneto-optical crystals (KTF, CeF₃), deep ultraviolet nonlinear optical crystals (modified BBO, CLBO), and high-power laser isolators, which are widely used in high-power laser systems, semiconductor lithography, EUV light sources, laser detection, defense, and new energy fields.

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