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Tools and Machinery

Polishing Pad K-800

Supplier

Colin-o

Part Number

K-800

Specifications

Parameter	Value
Thickness	1.40 ±0.10 mm
Density	0.47 ±0.05 g/cm3
Compression ratio	2.4 ±1.5 %
Hardness C	80-85
Dimensions	1400+50

Applications

Quartz, pottery jars, sapphire, silicon carbide

Key Features

1. Synthetic-fiber polishing pads are mainly used for high-precision polishing of glass and wafers to obtain defect-free surfaces. 2. Polyurethane pads are made from polyurethane foam and can contain abrasive materials including cerium oxide and zirconium oxide, as well as pure polyurethane polishing skin; the series can be used with different polishing slurries. 3. Black-nap polishing pads work with different slurries; their surface porosity retains slurry to achieve high precision. 4. Suitable for precision polishing of ceramics, GaAs, InP, optical glass, metal products, sapphire substrates, SIC substrates and other materials.

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Supplier Information

Colin-o

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Dongguan Colin Ao Semiconductor Materials Co., Ltd. focuses on grinding and polishing materials and environmentally friendly cleaning agents. Founded in 2018, it is located in Xinghui Industrial Park, Shipai Town, Dongguan, the hinterland of the Guangzhou-Shenzhen-Hong Kong golden corridor and the geometric center of the Pearl River Delta. The company is a technology-based enterprise and high-tech enterprise integrating R&D, production, and sales for industries such as sapphire, gallium arsenide (GaAs), silicon carbide (SiC), gallium nitride (GaN), indium phosphide, semiconductor wafers, LT/LN, and optics. It provides high-end customers with professional overall solutions and pre-sales, in-sales, and after-sales services.

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Polishing Pad K-800

Colin-o · Tools and Machinery

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Polishing Pad K-800

Specifications

Applications

Key Features

Datasheet

Supplier Information

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