Industrial Two-Dimensional Film Thickness Measurement System
Fully automatic semiconductor film-thickness measurement system using visible light. White-light interference generally follows d=(wave2-wave1)/deltaWave*K, where wave denotes wavelength, deltaWave the two-peak wavelength difference and K refractive coefficient. It normally measures1um-100um films: Around200nm UV for 1um films, 500-600nm visible for 10-50um films, and 800nm infrared for films around80um. Above100um, calipers are recommended. Transparent films use transmission; opaque films such as semiconductor photoresist or aluminum lens coatings use reflection. XY motors enable automatic planar mapping with 150mm*150mm travel and customizable maximum1000mm*1000mm. An SPM3 UV-visible-near-IR hyperspectral thickness map shows thin regions blue and thick regions red. Douyin demonstration: https://www.douyin.com/user/self?modal_id=7363167072077057280 ; Bilibili: https://www.bilibili.com/video/BV1sH4y1V7CD/ . Integrated visible spectroscopy, a broad-spectrum long-life tungsten-halogen or xenon source, and a reflection probe support thin-film, semiconductor-coating and eyeglass-coating thickness measurements.
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