Specifications
| Parameter | Value |
|---|---|
| LNOI Standard Wafer Size | 4 inches / 2 cm×2 cm |
| LNOI Feature Size | ≥150 nm; typical 1.4 μm |
| LNOI Typical Etch Depth | 250/300 nm |
| LNOI Center Wavelength | 1550 nm |
| SOI Standard Wafer Size | 15×15 mm, 20×20 mm, 4 inches |
| SOI Feature Size | ≥50 nm; typical 450/500/550 nm |
| SOI Typical Etch Depth | 220/340 nm |
| SOI Transmission Loss at 1550 nm | Expected ~2 dB/cm |
| Silicon Nitride Feature Size | Typical 1 μm |
| Silicon Nitride Typical Etch Depth | 300/800 nm |
| Silicon Nitride Transmission Loss at 1550 nm | Expected ~0.1 dB/cm |
Datasheet
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