Z-Axis Vertical Lift Stage
The REI_V series nano vertical lift stage is a standardized, modular, wedge-type high-precision vertical lift platform. Driven by coreless linear motors with precision crossed-roller guidance, it is the best combination of speed, accuracy, system resolution, bi-directional repeatability, reliability and compact size. As a derivative of the REI series, it delivers the same motion performance as the REI_LM series and is the best Z-axis choice for space-constrained applications. Non-contact direct drive technology features high dynamic performance, zero cogging, sub-nanometer resolution, extremely low velocity ripple, high speed and high accuracy; the unique structural design and compact size allow high performance even in tight installation spaces. The REI_V series features a standardized universal mounting pattern for easy system integration; 2-axis, 3-axis or more-axis applications can be flexibly assembled and configured using standard mounting holes. The REI225V nano vertical lift stage is available with an optional counterbalance configuration using a nearly frictionless balancing mechanism, with counterbalance capacity user-adjustable from 0 to 15 kg. The REI_V nano vertical lift stage achieves minimum incremental motion of better than 5 nm in linear motor applications. With zero backlash and near-zero system hysteresis, it enables precise, highly repeatable nanometer-level motion as well as extremely low-speed smooth motion (10 nm/s).
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Overview
Specifications
| Parameter | Value |
|---|---|
| Travel | 3mm |
| Accuracy (EC) | <350nm |
| Accuracy (Base) | <250nm |
| Accuracy (Plus) | <200nm |
| Resolution (EC) | 1Vpp Sin/Cos(典型值=20um/16384~1.2nm) |
| Resolution (Base) | 1Vpp Sin/Cos(典型值=20um/65536~0.3nm) |
| Resolution (Plus) | 1Vpp Sin/Cos(典型值=20um/65536~0.3nm) |
| Min. Incremental Motion (EC) | 10nm |
| Min. Incremental Motion (Base) | 3nm |
| Min. Incremental Motion (Plus) | 2nm |
| Bi-Directional Repeatability (EC) | <250nm |
| Bi-Directional Repeatability (Base) | <250nm |
| Bi-Directional Repeatability (Plus) | <175nm |
| Straightness | <1.5um |
| Flatness | <2.5um |
| Roll | 8 arc secarc sec |
| Yaw | 5 arc secarc sec |
| Maximum Speed (Upper Axis) | 100mm/s |
| Maximum Acceleration (No Load) | 0.45g |
| Maximum Force (Continuous) | 40N |
| Load Capacity (Vertical) | 1.5kg |
| Moving Mass | 0.6kg |
| Stage Mass | 1.44kg |
| Traceability For Calibration | ISO230-2 or GB17421,往返5次,≥10Plot/L |
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