REI95XY Nanopositioning Stage

Accuracy (Base): <0.6 μm @300mm; <0.75 μm @400mm; <0.75 μm @500mm; <0.75 μm @600mm Accuracy (Plus): <350 nm @300mm; <400 nm @400mm; <400 nm @500mm; <400 nm @600mm

The SWI560LM Ite IV series sub-micron precision direct drive stage is the latest generation of sub-micron direct drive stages refined through continuous optimization. It delivers high accuracy and high dynamic performance, achieving nanometer-level minimum incremental motion and sub-micron bi-directional repeatability; after linear error compensation, bi-directional repeatability is up to better than 150 nm and positioning accuracy better than 300 nm. The stage is directly driven by a high-efficiency coreless linear motor with zero-clearance transmission and zero cogging, providing smooth motion and outstanding dynamic response. Using a long-life SP-grade rolling-friction guideway bearing system combined with a specially designed low-friction integrated side-sealing structure, it effectively prevents process debris, dust and obvious particles from entering the stage, improving service life; an optional positive-pressure air purge system makes it suitable for industrial applications such as high-dynamic laser processing. The product offers four travel options of 300/400/500/600 mm and two configurations, Base and Plus, with maximum speeds up to 2000 mm/s and a complete single-axis/multi-axis cable management solution; cleanroom, vacuum and low-temperature versions can be provided through special treatment.

Maximum machine base thickness: 40; 30mm Single Support weight: 4.7; 5.9; 9.3; 18.8kg

Specially formed elastic body subjects are combined with steel presses and outer plates;

Flatness: ≤1.5mm/m² Size differential: ≤±1mm Gravity: ≥100µm

Product details;

Size differential: ≤±1mm Epoxy thickness: ≥3mm Steel: ≥1.0E+08N/m

Product details;