Telescope Array 150/500 and 200/400
Telescope-Arrays designed for collimating the slow axis of diode laser bars with emitter pitches of 400 or 500 μm.
Specification Snapshot
Thickness (T) ZLA000390
4.5±0.01mm
Thickness (T) ZLA000579
2.93±0.01mm
Thickness (T) ZLA000593
2.93±0.01mm
Effective Focal Length (EFL) @ 808nm ZLA000390
2.48mm
Effective Focal Length (EFL) @ 808nm ZLA000579
1.62mm
Effective Focal Length (EFL) @ 808nm ZLA000593
1.62mm
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Overview
Telescope-Arrays designed for collimating the slow axis of diode laser bars with emitter pitches of 400 or 500 μm.
Specifications
| Parameter | Value |
|---|---|
| Material | S-TIH53 (Ohara) |
| Refractive Index n @ 808nm | 1.823 |
| Product Code ZLA000390 | ZLA000390 |
| Product Code ZLA000579 | ZLA000579 |
| Product Code ZLA000593 | ZLA000593 |
| Width (W) ZLA000390 | 12.0±0.05mm |
| Width (W) ZLA000579 | 12.0±0.05mm |
| Width (W) ZLA000593 | 10.8±0.05mm |
| Length (L) ZLA000390 | 1.5±0.05mm |
| Length (L) ZLA000579 | 1.0±0.05mm |
| Length (L) ZLA000593 | 1.0±0.05mm |
| Thickness (T) ZLA000390 | 4.5±0.01mm |
| Thickness (T) ZLA000579 | 2.93±0.01mm |
| Thickness (T) ZLA000593 | 2.93±0.01mm |
| Pitch (P) ZLA000390 | 500μm |
| Pitch (P) ZLA000579 | 400μm |
| Pitch (P) ZLA000593 | 400μm |
| Max. Emitter Size ZLA000390 | 150μm |
| Max. Emitter Size ZLA000579 | 200μm |
| Max. Emitter Size ZLA000593 | 200μm |
| Clear Aperture (Aw×Ax) ZLA000390 | 11.0×1.4mm² |
| Clear Aperture (Aw×Ax) ZLA000579 | 11.0×1.4mm² |
| Clear Aperture (Aw×Ax) ZLA000593 | 10.4×0.9mm² |
| Average Radius - Side A / Side B ZLA000390 | 2.05±0.04/3.95±0.08mm |
| Average Radius - Side A / Side B ZLA000579 | 1.35±0.03/2.56±0.05mm |
| Average Radius - Side A / Side B ZLA000593 | 1.35±0.03/2.56±0.05mm |
| Effective Focal Length (EFL) @ 808nm ZLA000390 | 2.48mm |
| Effective Focal Length (EFL) @ 808nm ZLA000579 | 1.62mm |
| Effective Focal Length (EFL) @ 808nm ZLA000593 | 1.62mm |
| Numerical Aperture (NA) ZLA000390 | 0.29 |
| Numerical Aperture (NA) ZLA000579 | 0.29 |
| Numerical Aperture (NA) ZLA000593 | 0.29 |
| Typical Remaining Divergence (FW/e²) ZLA000390 | <2mrad |
| Typical Remaining Divergence (FW/e²) ZLA000579 | <2mrad |
| Typical Remaining Divergence (FW/e²) ZLA000593 | <2mrad |
| AR Coating ZLA000390 | 790-990nm |
| AR Coating ZLA000579 | 790-990nm |
| AR Coating ZLA000593 | 760-850nm |
| Transmission ZLA000390 | >99% |
| Transmission ZLA000579 | >99% |
| Transmission ZLA000593 | >99% |
| Surface Imperfections (DIN ISO10110-7) ZLA000390 | 5/10×0.025; C4×0.1; L4×0.04 E |
| Surface Imperfections (DIN ISO10110-7) ZLA000579 | 5/10×0.025; C2×0.1; L2×0.025 E |
| Surface Imperfections (DIN ISO10110-7) ZLA000593 | 5/10×0.025; C4×0.1; L4×0.04 E |
Applications
1. Collimation of slow axis in diode laser bars 2. Precision optical systems requiring slow axis collimation
Key Features
1. Double-sided structure for enhanced collimation 2. High transmission rate (>99%) 3. Precision-engineered for diode laser applications
Datasheet
Product Datasheet
PDF
Supplier Information
<p>Focuslight Technology is a national high-tech enterprise and a company listed on the Science and Technology Innovation Board of the Shanghai Stock Exchange (stock code: 688167). It was established in September 2007. It is mainly engaged in the research and development, production and sales of laser light sources and raw materials, optical components in the upstream of the photonic industry chain, and photonic application modules, modules and subsystems in the midstream of the photonic industry chain. It is currently expanding its global photonic process and manufacturing service business. The company focuses on the application directions of optical communications, consumer electronics, and pan-semiconductor manufacturing processes. It has now developed into an influential company and brand in the field of high-power semiconductor lasers and applications in the world. It has production bases and core technical teams in Xi'an, Dongguan, Shaoguan, and Hefei in China, Dortmund in Germany, Neuchâtel in Switzerland, Singapore, and Malaysia.</p>
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