Telescope Array 150/500 and 200/400
Telescope-Arrays designed for collimating the slow axis of diode laser bars with emitter pitches of 400 or 500 μm.
Specification Snapshot
Thickness (T) ZLA000390
4.5±0.01mm
Thickness (T) ZLA000579
2.93±0.01mm
Thickness (T) ZLA000593
2.93±0.01mm
Effective Focal Length (EFL) @ 808nm ZLA000390
2.48mm
Effective Focal Length (EFL) @ 808nm ZLA000579
1.62mm
Effective Focal Length (EFL) @ 808nm ZLA000593
1.62mm
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Overview
Telescope-Arrays designed for collimating the slow axis of diode laser bars with emitter pitches of 400 or 500 μm.
Specifications
| Parameter | Value |
|---|---|
| Refractive Index n @ 808nm | 1.823 |
| Product Code ZLA000390 | ZLA000390 |
| Product Code ZLA000579 | ZLA000579 |
| Product Code ZLA000593 | ZLA000593 |
| Width (W) ZLA000390 | 12.0±0.05mm |
| Width (W) ZLA000579 | 12.0±0.05mm |
| Width (W) ZLA000593 | 10.8±0.05mm |
| Length (L) ZLA000390 | 1.5±0.05mm |
| Length (L) ZLA000579 | 1.0±0.05mm |
| Length (L) ZLA000593 | 1.0±0.05mm |
| Thickness (T) ZLA000390 | 4.5±0.01mm |
| Thickness (T) ZLA000579 | 2.93±0.01mm |
| Thickness (T) ZLA000593 | 2.93±0.01mm |
| Max. Emitter Size ZLA000390 | 150μm |
| Max. Emitter Size ZLA000579 | 200μm |
| Max. Emitter Size ZLA000593 | 200μm |
| Clear Aperture (Aw×Ax) ZLA000390 | 11.0×1.4mm² |
| Clear Aperture (Aw×Ax) ZLA000579 | 11.0×1.4mm² |
| Clear Aperture (Aw×Ax) ZLA000593 | 10.4×0.9mm² |
| Average Radius - Side A / Side B ZLA000390 | 2.05±0.04/3.95±0.08mm |
| Average Radius - Side A / Side B ZLA000579 | 1.35±0.03/2.56±0.05mm |
| Average Radius - Side A / Side B ZLA000593 | 1.35±0.03/2.56±0.05mm |
| Effective Focal Length (EFL) @ 808nm ZLA000390 | 2.48mm |
| Effective Focal Length (EFL) @ 808nm ZLA000579 | 1.62mm |
| Effective Focal Length (EFL) @ 808nm ZLA000593 | 1.62mm |
| Numerical Aperture (NA) ZLA000390 | 0.29 |
| Numerical Aperture (NA) ZLA000579 | 0.29 |
| Numerical Aperture (NA) ZLA000593 | 0.29 |
| Typical Remaining Divergence (FW/e²) ZLA000390 | <2mrad |
| Typical Remaining Divergence (FW/e²) ZLA000579 | <2mrad |
| Typical Remaining Divergence (FW/e²) ZLA000593 | <2mrad |
| AR Coating ZLA000390 | 790-990nm |
| AR Coating ZLA000579 | 790-990nm |
| AR Coating ZLA000593 | 760-850nm |
| Transmission ZLA000390 | >99% |
| Transmission ZLA000579 | >99% |
| Transmission ZLA000593 | >99% |
| Surface Imperfections (DIN ISO10110-7) ZLA000390 | 5/10×0.025; C4×0.1; L4×0.04 E |
| Surface Imperfections (DIN ISO10110-7) ZLA000579 | 5/10×0.025; C2×0.1; L2×0.025 E |
| Surface Imperfections (DIN ISO10110-7) ZLA000593 | 5/10×0.025; C4×0.1; L4×0.04 E |
Applications
1. Collimation of slow axis in diode laser bars 2. Precision optical systems requiring slow axis collimation
Key Features
1. Double-sided structure for enhanced collimation 2. High transmission rate (>99%) 3. Precision-engineered for diode laser applications
Datasheet
Product Datasheet
PDF
Supplier Information
Juguang Technology is a national-level high-tech enterprise and a company listed on the STAR Market of the Shanghai Stock Exchange (Stock Code: 688167). Founded in September 2007, the company is primarily engaged in the research, development, production, and sales of laser light sources and raw materials—which are part of the upstream segment of the photonics industry chain—as well as optical components and photonics application modules, assemblies, and subsystems—which are part of the midstream segment. It is currently expanding its global photonics process and manufacturing services business. The company focuses on application areas such as optical communications, consumer electronics, and semiconductor manufacturing processes. It has grown into an influential company and brand in the global high-power semiconductor laser and application sectors, with production facilities and core technical teams in Xi’an, Dongguan, Shaoguan, Hefei, and Sichuan in China; Dortmund, Germany; Neuchâtel, Switzerland; Singapore; and Malaysia.
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