200-400nm Mirror
宏策光电's 56°-200-400nm broadband mirror is designed for large-angle UV incidence. At 56° incidence, it provides high reflectance across 200–400nm. Its precision multilayer dielectric coating is dense, UV-radiation resistant and has a high laser-damage threshold, tolerating prolonged exposure to high-energy UV pulsed lasers. It suits complex optical systems requiring efficient broadband UV beam folding, with stable, reliable reflection.
Specification Snapshot
Substrate
Quartz, Calcium Fluoride CaF2 and Other Materials
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Overview
宏策光电's 56°-200-400nm broadband mirror is designed for large-angle UV incidence. At 56° incidence, it provides high reflectance across 200–400nm. Its precision multilayer dielectric coating is dense, UV-radiation resistant and has a high laser-damage threshold, tolerating prolonged exposure to high-energy UV pulsed lasers. It suits complex optical systems requiring efficient broadband UV beam folding, with stable, reliable reflection.
Specifications
| Parameter | Value |
|---|---|
| Substrate | Quartz, Calcium Fluoride CaF2 and Other Materials |
| Dimensions / Angle | Customer Customization |
| Spectrum Rave [56° Incidence (Product Introduction); 200-400nm; Average Reflectance] | Rave>95%@200-400nm |
Applications
Mirrors for UV Broadband Sources, Spectral Analyzers, Deep-UV Laser Path Bending and Research Instruments, Wide-Angle Broadband Reflection
Datasheet
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Supplier Information
Suzhou Hongce Optoelectronics Technology Co., Ltd., founded in August 2015, specializes in the R&D and production of precision optical nano-film devices and PVD coating equipment, covering wavelength ranges from infrared to X-ray and neutron optics, providing one-stop solutions. The company has mastered core technologies in short-wavelength optics such as EUV and X-ray, achieving domestic substitution. With multiple coating and testing equipment, it holds over 40 intellectual properties. Products include DUV/EUV lithography thin-film devices, laser films, multilayer Laue lenses (MLL), X-ray detection crystals, serving major national scientific platforms like lithography, synchrotron radiation, and elemental analysis.
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