Laser Micro/Nanoprocessing System - SabRay Series

Laser Micro/Nanoprocessing System - SabRay Series

Supplier
Uptekopto
Part Number
SabRay
Category
Laser Processing Equipment
Origin
China

The SabRay ultraprecision laser micro/nanomachining series offers ultrafast lasers of various brands/models, electrically controlled micro/nanometer-precision stages and varied focusing heads. A compact granite base/gantry provides industrial stability/reliability. Enclosed beam delivery, adjustment and imaging include beam shaping, power monitoring, coaxial illumination and vision. These small desktop systems offer universities/research institutes solutions for femtosecond-laser precision etching, micro/nanostructure fabrication, direct writing of photonic devices, surface functionalization, extreme nanoscale processing, touch-panel/ITO cutting, drilling/cutting of metals and ceramics, and waveguide fabrication on/inside silicon for frontier optoelectronic-device research.

Specification Snapshot
Pulse Width [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]
≤35 fs
Output Power [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]
≥7 W
Repetition Rate [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]
Up to 10KHz
Center Wavelength [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]
790±10
Energy Stability [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]
<0.75%RMS
Polarization State [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]
Linear Polarization, Horizontal Direction
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Overview

The SabRay ultraprecision laser micro/nanomachining series offers ultrafast lasers of various brands/models, electrically controlled micro/nanometer-precision stages and varied focusing heads. A compact granite base/gantry provides industrial stability/reliability. Enclosed beam delivery, adjustment and imaging include beam shaping, power monitoring, coaxial illumination and vision. These small desktop systems offer universities/research institutes solutions for femtosecond-laser precision etching, micro/nanostructure fabrication, direct writing of photonic devices, surface functionalization, extreme nanoscale processing, touch-panel/ITO cutting, drilling/cutting of metals and ceramics, and waveguide fabrication on/inside silicon for frontier optoelectronic-device research.

Specifications

ParameterValue
Pulse Width [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]≤35 fs
Output Power [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]≥7 W
Repetition Rate [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]Up to 10KHz
Center Wavelength [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]790±10
Spot Mode [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]M²≤1.3(TEM₀₀)
Energy Stability [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]<0.75%RMS
Contrast [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]>1000:1 pre pulse;>150:1 post pulse
Beam Stability [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]<20 μrad/°C
Spot Size [Page3 SabRay Compatible Ti:sapphire/Astrella;Custom Parameters,Not Unconditional System Specs;1/e²]~6
Polarization State [Page 3 SabRay Compatible Laser: Ti:sapphire/Astrella; All Parameters Customizable; Not Unconditional Whole-System Specifications]Linear Polarization, Horizontal Direction
Pulse Width [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]≤290 fs
Output Power [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]10、20
Repetition Rate [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]Up to 1MHz
Center Wavelength [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]515nm, and 1030nm
Spot Mode [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]M²≤1.5(TEM₀₀)
Energy Stability [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]<0.5%RMS
Contrast [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]>1000:1 pre pulse;>150:1 post pulse
Beam Stability [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]<20 μrad/°C
Spot Size [Page3 SabRay Compatible Laser Yb:KGW/Pharos;Custom Parameters,Not Unconditional System Specs;1/e²]~3
Polarization State [Page 3 SabRay Compatible Laser: Yb:KGW/Pharos; All Parameters Customizable; Not Unconditional Whole-System Specifications]Linear Polarization, Horizontal Direction
Pulse Width [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]≤350 fs
Output Power [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]50、100
Repetition Rate [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]Up to 1MHz
Center Wavelength [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]515nm, and 1030nm
Spot Mode [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]M²≤1.5(TEM₀₀)
Energy Stability [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]<0.5%RMS
Contrast [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]>1000:1 pre pulse;>150:1 post pulse
Beam Stability [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]<50 μrad/°C
Spot Size [Page3 SabRay Compatible Laser Yb:KGW/Tangor;Custom Parameters,Not Unconditional System Specs;1/e²]~3
Polarization State [Page 3 SabRay Compatible Laser: Yb:KGW/Tangor; All Parameters Customizable; Not Unconditional Whole-System Specifications]Linear Polarization, Horizontal Direction
Input Aperture [Page 3 SabRay Compatible Additional Module: Scanning Galvanometer; All Parameters Customizable]≤14 mm
Standard Scan Angle [Page 3 SabRay Compatible Additional Module: Scanning Galvanometer; All Parameters Customizable]40 °
Focal Length [Page 3 SabRay Compatible Additional Module: Field Lens; All Parameters Customizable]f60/f100/f150
Magnification [Page 3 SabRay Compatible Additional Module: Objective; All Parameters Customizable]5X/10X/20X/50X
Attenuation Range [Page 3 SabRay Compatible Additional Module: Power Attenuator; All Parameters Customizable]0.1%~97%
Switching Delay [Page 3 SabRay Compatible Additional Module: Shutter; All Parameters Customizable]170 ms
Bragg-Grating Inscription Contrast [Independent Typical Application Text on Page 4; Fiber Bragg Grating Writing]50 dB
Travel [Page 3 SabRay Compatible Motion Platform X Axis; All Parameters Customizable]≤200 mm
Resolution [Page 3 SabRay Compatible Motion Platform X Axis; All Parameters Customizable]1 nm
Positioning Accuracy [Page 3 SabRay Compatible Motion Platform X Axis; All Parameters Customizable]≤±300
Positioning Repeatability [Page 3 SabRay Compatible Motion Platform X Axis; All Parameters Customizable; Bidirectional]≤±100
Maximum Speed [Page 3 SabRay Compatible Motion Platform X Axis; All Parameters Customizable]350 mm/s
Maximum Load [Page 3 SabRay Compatible Motion Platform X Axis; All Parameters Customizable]12 kg
Travel [Page 3 SabRay Compatible Motion Platform Y Axis; All Parameters Customizable]≤200 mm
Resolution [Page 3 SabRay Compatible Motion Platform Y Axis; All Parameters Customizable]1 nm
Positioning Accuracy [Page 3 SabRay Compatible Motion Platform Y Axis; All Parameters Customizable]≤±300
Positioning Repeatability [Page 3 SabRay Compatible Motion Platform Y Axis; All Parameters Customizable; Bidirectional]≤±100
Maximum Speed [Page 3 SabRay Compatible Motion Platform Y Axis; All Parameters Customizable]350 mm/s
Maximum Load [Page 3 SabRay Compatible Motion Platform Y Axis; All Parameters Customizable]12 kg
Travel [Page 3 SabRay Compatible Motion Platform Z (Air Bearing) Axis; All Parameters Customizable]≤160 mm
Resolution [Page 3 SabRay Compatible Motion Platform Z (Air Bearing) Axis; All Parameters Customizable]1 nm
Positioning Accuracy [Page 3 SabRay Compatible Motion Platform Z (Air Bearing) Axis; All Parameters Customizable]≤±200
Positioning Repeatability [Page 3 SabRay Compatible Motion Platform Z (Air-Bearing) Axis; All Parameters Customizable; Bidirectional]≤±100
Maximum Speed [Page 3 SabRay Compatible Motion Platform Z (Air Bearing) Axis; All Parameters Customizable]200 mm/s
Maximum Load [Page 3 SabRay Compatible Motion Platform Z (Air Bearing) Axis; All Parameters Customizable]12 kg

Applications

Precision Laser Etching,Cutting and Hole Making;Laser Microstructure Fabrication;High-Precision Scribing/Cutting of Phone Cover Glass and ITO Conductive Films;2D/3D Surface Microstructures Down to Nanometer Dimensions;Waveguide Engraving,Fiber-Grating Writing;Nanodrilling

Key Features

Integrated Precision Multiaxis Stage;Ultrastable Granite Gantry;Various Ultrafast Lasers;Modular Beam Delivery;Versatile Processing Head;CNC3-Axis PSO,Linear/Arc/Helical Interpolation;G-Code,DXF/DWG Direct Galvo Processing;Online Power Monitor/Control;Coaxial Vision for Positioning/Real-Time Process/Quality;Custom Vacuum Pump/Dust Collector;Optional Galvo/High-NA Objective;Custom Vacuum Chucks,Fiber/Waveguide-Writing Fixtures

Datasheet

Product Datasheet
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Supplier Information

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Xi'an Shangtai Optoelectronic Technology Co., Ltd., established in 2013 and located in Xi'an High-tech Zone, mainly engaged in technical services, R&D, production, sales, agency of ultrafast laser products, ultrafast laser processing and manufacturing systems, optical electronic products, high-precision machine tools, machine vision and photoelectric detection instruments, and software development. Adhering to the philosophy of 'technology as the core, market as the guide', the company's products are widely applied in fundamental scientific research, new material research, precision machining, high-performance measurement, etc. Its main products include SabRay femtosecond laser micromachining system, ImpeRay micromachining system, various processing heads, EOS7500 electro-optic switch, etc., providing optimal solutions for femtosecond ultra-fine micromachining for both scientific and industrial users.

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Laser Micro/Nanoprocessing System - SabRay Series
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