Maskless Ultraviolet Laser Direct Writing System
The system provides precise patterning of micro/nano structures with submicrometer resolution and accurate positioning, combining large area processing with submicrometer precision. It supports research on optoelectronic devices such as microdisplay chips and testing of atmosphere sensitive materials such as perovskites. Its compact size allows operation inside a glovebox under a controlled atmosphere.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Exposure area | ( Single Pass Processing Range ， Stitching Supports Larger Large Pattern ) |
| Sample Dimensions | 5 x 5 mm2to 48 × 48mm2 |
| Power Supply | 50/60 Hz, 16 A |
Applications
Key Features
Datasheet
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