Two-Dimensional Beamsplitter

Diffractive optical elements use diffraction for beam shaping and wavefront transformation. Precisely etched micro/nano relief modulates phase or amplitude, producing diffraction/interference that reconstructs a designed intensity distribution in the far field or target plane. Effects include splitting, homogenization, and pattern generation. A two-dimensional splitter is a typical DOE. Definition: it divides one incident laser along two orthogonal directions into an M×N matrix of equally spaced, balanced-intensity spots. Applications include machine vision, motion-sensing technology, sensing, and aerospace; see schematic. Key parameters: 1. Wavelength. Splitters are wavelength-sensitive and designed for a particular laser, such as red/green; custom substrates include fused silica, silicon, and ZnSe. 2. Rows/columns. Any N×M matrix may be customized, with standard equally spaced or asymmetric arrangements. 3. Split angles. Horizontal/vertical angles are independently customized with small control error and orderly arrays. 4. Uniformity. Low intensity differences avoid obvious brightness variation among spots. 5. Diffraction efficiency. High overall utilization reduces transmission energy loss. 6. Zero-order suppression. The central zero-order spot is harder to suppress in two-dimensional arrays, making this a key design metric. Principles: 1. Two-dimensional phase modulation. Etched relief carries a computed two-dimensional hologram; X/Y phase distributions independently diffract incident light. 2. Orthogonal superposition/interference. The effect is understood as the product of two orthogonal one-dimensional splitting gratings. Iterative Fourier-transform and other algorithms optimize phase for orderly, uniformly energized far-field arrays. Customization/manufacturing: two-dimensional splitters are core independently developed diffractive products. The company describes itself as a Chinese independent developer with years of micro/nano-optical experience, employing engineers in design, fabrication, and inspection with extensive practical DOE expertise. An integrated lithography/dry-etching platform controls the full design-to-product process. Customer laser specifications, system structure, working distance, and space constraints guide custom matrix layouts, horizontal/vertical counts, row/column angles, wavelengths, and substrates. Optimization improves full-array uniformity, edge consistency, and zero-order suppression, addressing uneven brightness, position shifts, and energy imbalance. Early optical simulation and microstructure optimization predict splitting results and reduce integration risks/prototype costs. Flexible production supports special-parameter research/university prototypes and advanced experiments as well as standardized high-volume industrial orders. Each finished device receives complete item-by-item inspection of matrix efficiency, full-field uniformity, row/column angular accuracy, and spot positions. Formal reports can accompany shipments for consistent stable batch output. A complete domestic line improves turnaround/lead times; dedicated one-to-one support responds quickly to presales changes, optical matching, on-site setup, and after-sales corrections. The company presents itself as a high-value, stable Chinese matrix-splitter supplier. Contact it for custom work and professional efficient technical/product service. Page summary: Diffractive Optical Elements (DOE) are described as new optics developed from binary optics. Image captions: two-dimensional splitter schematic; simulated spot distribution; experimentally measured spots.

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