Homogenizing DOE ODHD264-10600

Homogenizing DOE ODHD264-10600

Supplier
Jcoptix
Part Number
ODHD264-10600
Category
Diffractive Optics
Origin
China

JCOPTIX homogenizing DOEs use microstructures etched into quartz or other materials to modulate the phase of an incident spot, converting a Gaussian beam to a flat-top beam while shaping it. They require high-quality incident spots with strict adherence to the specified input M2 and size; otherwise final homogenization is affected. Their multilevel design and antireflection coating provide high transmission and diffraction efficiency at the operating wavelength. Applications include cutting, ablation, drilling, scribing, annealing, aesthetic medicine, and microscopy. Operating wavelength, spot shape, and spot size can be customized to input/output beam requirements. Contact technical support for customization. Infrared homogenizing DOEs, material: ZnSe. Applicable models: ODHD264-10600, ODHS264-10600. Operating wavelength: 10.6 μm; output spots: circular or square; diffraction efficiency: >90%; custom wavelengths and output spot sizes available. JCOPTIX ZnSe infrared homogenizing DOEs operate at 10.6 μm and produce circular or square spots of different sizes. Their multilevel design and antireflection coating provide diffraction efficiency above 90% and nonuniformity below 10%. Applications include thermal-imaging source shaping and CO₂ laser (10.6 µm) homogenization. Operating wavelength, spot shape, and size can be customized to input/output beam requirements. Quartz homogenizing DOEs, material: UVFS. Applicable models: ODHD13-532, ODHS13-532, ODHS200-532, ODHD900-1064, ODHS1410-1064. Operating wavelengths: 532 nm, 1064 nm; output spots: circular or square; diffraction efficiency: >90%; custom wavelengths and output spot sizes available. JCOPTIX quartz homogenizing DOEs operate at 532 nm and 1064 nm and produce circular or square spots of different sizes. Their multilevel design and antireflection coating provide diffraction efficiency above 90% and nonuniformity below 10%. Applications include cutting, ablation, drilling, scribing, annealing, aesthetic medicine, and microscopy. Operating wavelength, spot shape, and size can be customized to input/output beam requirements. Technical notes (page-level manufacturing capabilities and examples, retained as sourced). 1. Minimum grating period? The grating period is expressed as d=λ/sin θ. It is determined by the design wavelength and splitting angle: a shorter wavelength and larger angle between adjacent split beams produce a smaller period. One beam-splitter DOE period contains multiple micro/nanostructures that perform splitting. The figure below shows a typical period. The smallest pattern dimension within it, or minimum feature size, is important in determining manufacturability. Minimum-feature manufacturing capability is 1μm. Figure 1. Typical beam-splitting DOE period. Different split counts have different minimum feature sizes. The simplest structure, a 1×2 splitter, is shown in Figure 2. With a 1 μm minimum feature, the 1×2 splitter minimum period is 2 μm. Figure 2. 1×2 splitter period. Other splitting DOEs have complex patterns within each period; their minimum periods require specific design assessment based on wavelength, split count, and the fractional angle (source wording). 2. Etching resolution and accuracy? Minimum linewidth: 1 μm ± 50 nm; depth error: ±10 nm. 3. Maximum diffraction angle? Essentially the same issue as 1: a larger angle means a smaller period and minimum feature. The current maximum diffraction angle for manufactured beam-splitting DOEs is 30°. 4. Maximum diffraction-region size? The largest currently manufacturable diffractive-optic aperture is 400mm for two-level devices; the maximum multilevel size is 6 cun (source unit). 5. Operating wavelength range? Diffractive optics generally operate at a single wavelength. Various types can be manufactured from UV 193 nm to long-wave IR 10.6μm. 6. Residual zero order? The designed zero order can be 0. Sensitivity to tolerances varies with angle and splitting configuration. For example, for a 1×4 splitter with a total splitting angle of 5°, manufactured residual zero order can be kept below 0.03%.

Specification Snapshot
Dimensions
Ø25.4 + 0/-0.1 mm
Diffraction Efficiency
≥ 90%
Operating Wavelength
10.6μm
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Overview

JCOPTIX homogenizing DOEs use microstructures etched into quartz or other materials to modulate the phase of an incident spot, converting a Gaussian beam to a flat-top beam while shaping it. They require high-quality incident spots with strict adherence to the specified input M2 and size; otherwise final homogenization is affected. Their multilevel design and antireflection coating provide high transmission and diffraction efficiency at the operating wavelength. Applications include cutting, ablation, drilling, scribing, annealing, aesthetic medicine, and microscopy. Operating wavelength, spot shape, and spot size can be customized to input/output beam requirements. Contact technical support for customization. Infrared homogenizing DOEs, material: ZnSe. Applicable models: ODHD264-10600, ODHS264-10600. Operating wavelength: 10.6 μm; output spots: circular or square; diffraction efficiency: >90%; custom wavelengths and output spot sizes available. JCOPTIX ZnSe infrared homogenizing DOEs operate at 10.6 μm and produce circular or square spots of different sizes. Their multilevel design and antireflection coating provide diffraction efficiency above 90% and nonuniformity below 10%. Applications include thermal-imaging source shaping and CO₂ laser (10.6 µm) homogenization. Operating wavelength, spot shape, and size can be customized to input/output beam requirements. Quartz homogenizing DOEs, material: UVFS. Applicable models: ODHD13-532, ODHS13-532, ODHS200-532, ODHD900-1064, ODHS1410-1064. Operating wavelengths: 532 nm, 1064 nm; output spots: circular or square; diffraction efficiency: >90%; custom wavelengths and output spot sizes available. JCOPTIX quartz homogenizing DOEs operate at 532 nm and 1064 nm and produce circular or square spots of different sizes. Their multilevel design and antireflection coating provide diffraction efficiency above 90% and nonuniformity below 10%. Applications include cutting, ablation, drilling, scribing, annealing, aesthetic medicine, and microscopy. Operating wavelength, spot shape, and size can be customized to input/output beam requirements. Technical notes (page-level manufacturing capabilities and examples, retained as sourced). 1. Minimum grating period? The grating period is expressed as d=λ/sin θ. It is determined by the design wavelength and splitting angle: a shorter wavelength and larger angle between adjacent split beams produce a smaller period. One beam-splitter DOE period contains multiple micro/nanostructures that perform splitting. The figure below shows a typical period. The smallest pattern dimension within it, or minimum feature size, is important in determining manufacturability. Minimum-feature manufacturing capability is 1μm. Figure 1. Typical beam-splitting DOE period. Different split counts have different minimum feature sizes. The simplest structure, a 1×2 splitter, is shown in Figure 2. With a 1 μm minimum feature, the 1×2 splitter minimum period is 2 μm. Figure 2. 1×2 splitter period. Other splitting DOEs have complex patterns within each period; their minimum periods require specific design assessment based on wavelength, split count, and the fractional angle (source wording). 2. Etching resolution and accuracy? Minimum linewidth: 1 μm ± 50 nm; depth error: ±10 nm. 3. Maximum diffraction angle? Essentially the same issue as 1: a larger angle means a smaller period and minimum feature. The current maximum diffraction angle for manufactured beam-splitting DOEs is 30°. 4. Maximum diffraction-region size? The largest currently manufacturable diffractive-optic aperture is 400mm for two-level devices; the maximum multilevel size is 6 cun (source unit). 5. Operating wavelength range? Diffractive optics generally operate at a single wavelength. Various types can be manufactured from UV 193 nm to long-wave IR 10.6μm. 6. Residual zero order? The designed zero order can be 0. Sensitivity to tolerances varies with angle and splitting configuration. For example, for a 1×4 splitter with a total splitting angle of 5°, manufactured residual zero order can be kept below 0.03%.

Specifications

ParameterValue
DimensionsØ25.4 + 0/-0.1 mm
Thickness3 ± 0.1 mm
Surface Quality (Scratch / Dig)Diffraction Region 40/20, Nondiffraction Region 60/40
Element MaterialZnSe
Clear Aperture Dimension15 mm × 15 mm
Diffraction Efficiency≥ 90%
Operating Wavelength10.6μm
Transmittance (@ Operating Wavelength) [@ Operating Wavelength; @ Operating Wavelength)]> 98%
Output Beam ShapeCircular
Input Beam Diameter [1/e²]6 mm
Input Beam Quality FactorM2 < 1.2
Effective Lens Focal Length100 mm
Output Beam Dimensions [50%]Ø264 μm
Transition Region [Light Intensity 90%-13.5%]40 μm
Nonuniformity< 10%

Key Features

Antireflection Coated; Gaussian-to-Flat-Top Conversion; Diffraction Efficiency: >90%; Customizable Operating Wavelength and Output Spot Size

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Supplier Information

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Jcoptix
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Nanjing Jingcui Optical Technology Co., Ltd. (formerly Suzhou Jingcui Optical Technology Co., Ltd., abbreviated as JCOPTIX) is a national high-tech enterprise and a national-level specialized and sophisticated 'little giant' enterprise, established on the foundation of the Liquid Crystal and Photonics Research Center of Nanjing University. It engages in R&D, manufacturing, and sales of advanced optical technologies and products. JCOPTIX is dedicated to building a product platform for China's optical community, offering liquid crystal photonics components, precision optical components, optomechanics, fiber optic assemblies, motion control devices, and system solutions. All listed products can be found and ordered online at www.JCOPTIX.com.

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Homogenizing DOE ODHD264-10600
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