Diffractive Optical Element (DOE) Laser
Diffractive optical elements (DOEs) are an emerging class of optics. Micro/nano-etching typically forms two-dimensional arrays of diffractive units with defined geometry and refractive index to control laser-wavefront phase precisely. Light diffracts at each unit and interferes at a distance, usually infinity or a lens focal plane, to create a specified intensity distribution. ELITE works with overseas DOE suppliers and offers customized elements. Sixteen patterns are available, including dot matrices and 3-, 5-, 7-, 11- and 81-line patterns.
Specification Snapshot
Output Power
≤200 mW
Output Power [Pattern: Dot Array]
<150mW
Output Power [Pattern: True Random]
<200mW
Output Power [Pattern: Pseudorandom]
<200mW
Output Power [Pattern: 51x51 Grid]
<150mW
Output Power [Pattern: Multiple Lines]
<150mW
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Overview
Diffractive optical elements (DOEs) are an emerging class of optics. Micro/nano-etching typically forms two-dimensional arrays of diffractive units with defined geometry and refractive index to control laser-wavefront phase precisely. Light diffracts at each unit and interferes at a distance, usually infinity or a lens focal plane, to create a specified intensity distribution. ELITE works with overseas DOE suppliers and offers customized elements. Sixteen patterns are available, including dot matrices and 3-, 5-, 7-, 11- and 81-line patterns.
Specifications
| Parameter | Value |
|---|---|
| Output Power | ≤200 mW |
| Transverse Mode | Multimode |
| Drive Mode | Analog Modulation, Digital Modulation, Computer Control |
| Electrostatic Protection | Level 4 |
| Operating Temperature | -20℃ to 60℃ |
| Storage Temperature | -45℃ to 85℃ |
| Mean Time Between Failures | >10,000 hour |
| Optimal Wavelength Range [Pattern: Dot Array] | 560-720nm |
| Optimal Wavelength Range [Pattern: True Random] | 820-860nm |
| Optimal Wavelength Range [Pattern: Pseudorandom] | 810-850nm |
| Optimal Wavelength Range [Pattern: 51x51 Grid] | 530-660nm |
| Design Wavelength [Pattern: Dot Array] | 660nm |
| Design Wavelength [Pattern: True Random] | 830nm |
| Design Wavelength [Pattern: Pseudorandom] | 830nm |
| Design Wavelength [Pattern: 51x51 Grid] | 660nm |
| Output Power [Pattern: Dot Array] | <150mW |
| Output Power [Pattern: True Random] | <200mW |
| Output Power [Pattern: Pseudorandom] | <200mW |
| Output Power [Pattern: 51x51 Grid] | <150mW |
| Transverse Mode [Pattern: Dot Array] | Multimode |
| Transverse Mode [Pattern: True Random] | Multimode |
| Transverse Mode [Pattern: Pseudorandom] | Multimode |
| Transverse Mode [Pattern: 51x51 Grid] | Multimode |
| Pattern Size [Pattern: Dot Array; @100mm Distance; @Design Wavelength] | a=38.0mm b=26.6mm c=1.7mm d=26.6mm |
| Pattern Size [Pattern: True Random; @100mm Distance; @ Design Wavelength] | W:118.5mm H:86.9mm D:146.9mm |
| Pattern Size [Pattern: Pseudorandom; @100mm Distance; @ Design Wavelength] | W:118.5mm H:86.5mm D:146.7mm |
| Pattern Size [Pattern: 51x51 Grid; @100mm Distance; @ Design Wavelength] | W:39mm H:39mm D:55mm Line Spacing:0.77mm |
| Pattern Angles [Pattern: Dot Array; @ Design Wavelength] | α:21.5° β:15.2° γ:0.9° δ:15.2° |
| Pattern Angles [Pattern: True Random; @ Design Wavelength] | W:61.3° H:47.0° D:72.6° |
| Pattern Angles [Pattern: Pseudorandom; @ Design Wavelength] | W:61.3° H:46.8° D:72.5° |
| Pattern Angles [Pattern: 51x51 Grid; @ Design Wavelength] | W:22° H:22° D:31° Angle betw. Lines:0.44° |
| Drive Mode [Pattern: Dot Array] | Analog Modulation, Digital Modulation, Computer Control |
| Drive Mode [Pattern: True Random] | Analog Modulation, Digital Modulation, Computer Control |
| Drive Mode [Pattern: Pseudorandom] | Analog Modulation, Digital Modulation, Computer Control |
| Drive Mode [Pattern: 51x51 Grid] | Analog Modulation, Digital Modulation, Computer Control |
| Electrostatic Protection [Pattern: Dot Array] | Level 4 |
| Electrostatic Protection [Pattern: True Random] | Level 4 |
| Electrostatic Protection [Pattern: Pseudorandom] | Level 4 |
| Electrostatic Protection [Pattern: 51x51 Grid] | Level 4 |
| Operating Temperature [Pattern: Dot Array] | -20℃ to 60℃ |
| Operating Temperature [Pattern: True Random] | -20℃ to 60℃ |
| Operating Temperature [Pattern: Pseudorandom] | -20℃ to 60℃ |
| Operating Temperature [Pattern: 51x51 Grid] | -20℃ to 60℃ |
| Storage Temperature [Pattern: Dot Array] | -45℃ to 85℃ |
| Storage Temperature [Pattern: True Random] | -45℃ to 85℃ |
| Storage Temperature [Pattern: Pseudorandom] | -45℃ to 85℃ |
| Storage Temperature [Pattern: 51x51 Grid] | -45℃ to 85℃ |
| Optimal Wavelength Range [Pattern: Multiple Lines] | 530-670nm |
| Optimal Wavelength Range [Pattern: Lines & Dots] | 450-700nm |
| Optimal Wavelength Range [Pattern: Crosshairs] | 580-660nm |
| Optimal Wavelength Range [Pattern: Crosshairs & Dots] | 480-600nm |
| Design Wavelength [Pattern: Multiple Lines] | 635nm |
| Design Wavelength [Pattern: Lines & Dots] | 635nm |
| Design Wavelength [Pattern: Crosshairs] | 650nm |
| Design Wavelength [Pattern: Crosshairs & Dots] | 520nm |
| Output Power [Pattern: Multiple Lines] | <150mW |
| Output Power [Pattern: Lines & Dots] | <150mW |
| Output Power [Pattern: Crosshairs] | <150mW |
| Output Power [Pattern: Crosshairs & Dots] | <60mW |
| Transverse Mode [Pattern: Multiple Lines] | Multimode |
| Transverse Mode [Pattern: Lines & Dots] | Multimode |
| Transverse Mode [Pattern: Crosshairs] | Multimode |
| Transverse Mode [Pattern: Crosshairs & Dots] | Multimode |
| Pattern Size [Pattern: Multiple Lines; @100mm Distance; @Design Wavelength] | a=76.70mm b=54.4mm c=5.4mm d=54.5mm |
| Pattern Size [Pattern: Lines & Dots; @100mm Distance; @ Design Wavelength] | a=10.5mm b=2.6mm |
| Pattern Size [Pattern: Crosshair; @100mm Distance; @ Design Wavelength] | a=153.5mm |
| Pattern Size [Pattern: Crosshairs & Dots; @100mm Distance; @ Design Wavelength] | a=81.9mm b=16.1mm |
| Pattern Angles [Pattern: Multiple Lines; @ Design Wavelength] | α:40.2° β:30.4° γ:3.0° δ:30.4° |
| Pattern Angles [Pattern: Lines & Dots; @ Design Wavelength] | α:6° β:1.5° |
| Pattern Angles [Pattern: Crosshair; @ Design Wavelength] | α:75.0° |
| Pattern Angles [Pattern: Crosshairs & Dots; @ Design Wavelength] | α:44.5° β:9.2° |
| Drive Mode [Pattern: Multiple Lines] | Analog Modulation, Digital Modulation, Computer Control |
| Drive Mode [Pattern: Lines & Dots] | Analog Modulation, Digital Modulation, Computer Control |
| Drive Mode [Pattern: Crosshairs] | Analog Modulation, Digital Modulation, Computer Control |
| Drive Mode [Pattern: Crosshairs & Dots] | Analog Modulation, Digital Modulation, Computer Control |
| Electrostatic Protection [Pattern: Multiple Lines] | Level 4 |
| Electrostatic Protection [Pattern: Lines & Dots] | Level 4 |
| Electrostatic Protection [Pattern: Crosshairs] | Level 4 |
| Electrostatic Protection [Pattern: Crosshairs & Dots] | Level 4 |
| Operating Temperature [Pattern: Multiple Lines] | -20℃ to 60℃ |
| Operating Temperature [Pattern: Lines & Dots] | -20℃ to 60℃ |
| Operating Temperature [Pattern: Crosshairs] | -20℃ to 60℃ |
| Operating Temperature [Pattern: Crosshairs & Dots] | -20℃ to 60℃ |
| Storage Temperature [Pattern: Multiple Lines] | -45℃ to 85℃ |
| Storage Temperature [Pattern: Lines & Dots] | -45℃ to 85℃ |
| Storage Temperature [Pattern: Crosshairs] | -45℃ to 85℃ |
| Storage Temperature [Pattern: Crosshairs & Dots] | -45℃ to 85℃ |
Applications
Vehicle scanning; 3D scanning; machine vision; surface defect inspection; industrial measurement; structured light.
Key Features
405nm~980nm; solutions for different requirements; plug-and-play operation; overtemperature protection; reverse-polarity protection.
Datasheet
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Supplier Information
Elite Optoelectronics is committed to becoming a high-quality laser module manufacturer, supplier and solution provider in various fields.
Xi'an Elite Optoelectronics Technology Co., Ltd. was founded in 2003 and is located in the High-tech Zone of Xi'an, Shaanxi, China. Backed by the industry, academia, research and talent advantages of Greater Xi'an, it currently has a production and R&D base of more than 5,000 square meters, more than 200 production employees and an advanced and mature production management system, with the ability to provide reliable and continuous production and supply for global users. It has its own 500-square-meter professional testing laboratory and clean room, as well as a professional R&D team of more than 40 people. Since its establishment, it has always focused on the R&D and production of industrial-grade semiconductor and solid-state lasers. Over the past 20 years, it has provided customized laser application solutions to users in more than 40 countries around the world, and has won the long-term trust of global users with high-quality products and professional technical services.
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