Panel CMP TPP-5120
The board is manually placed on the upper and lower feed table, the board is placed on the upper and lower feed table and is then automatically polished, the platform is equipped with a friction endpoint test, and automatically polishes to the target value before it ceases.
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Overview
The board is manually placed on the upper and lower feed table, the board is placed on the upper and lower feed table and is then automatically polished, the platform is equipped with a friction endpoint test, and automatically polishes to the target value before it ceases.
Specifications
| Parameter | Value |
|---|---|
| Wafer Size | 515*510mm / 600*600mm |
| Number of heads polished | 1 units |
| Spraying the head diameter | OD930 mm |
| Disk diameter | OD1300 mm |
Key Features
Endpoint detection: with advanced high-precision EPD monitoring capability Partition pressure: optimized pressure distribution to ensure evenness of polishing; compatibility: equipment compatible with different sizes of base plate semi-automatic upper and lower material: unique light contact with the upper and lower feed system, avoiding damage
Datasheet
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Supplier Information
Beijing TSD Semiconductor Equipment Co., Ltd. is a national high-tech enterprise with independent intellectual property rights, focusing on the R&D, production, and sales of ultra-precision planar processing equipment for the semiconductor field. With the mission of "leading semiconductor technology progress and assisting customer development", it is committed to becoming a globally leading semiconductor equipment manufacturer.
Guided by the technology orientation of "flatter, thinner, more reliable", TSD deeply cultivates ultra-precision planar processing technology in fields such as semiconductor substrate materials, wafer manufacturing, semiconductor devices, advanced packaging, and MEMS, forming core technical advantages of leading technology, superior performance, and stable processes, and can provide systematic solutions and process equipment for thinning, polishing, and CMP.
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